A Deep UV Imaging System For Lithography And Process Development

Paul Michaloski; Paul Dewa

doi:10.1117/12.960207

16 December 1988 A Deep UV Imaging System For Lithography And Process Development

Paul Michaloski, Paul Dewa

Proceedings Volume 0998, Excimer Beam Applications; (1988) https://doi.org/10.1117/12.960207
Event: O-E/Fiber LASE '88, 1988, Boston, MA, United States

Abstract

A simple optical imaging system has been designed and built for printing sub-half-micron lithographic images at 248 nm. The following discusses the design considerations of producing a system that can achieve the optical and mechanical criteria of microlithography while still maintaining the simplicity and versatility for a research and development instrument. Also, discussed are designs of lenses that perform at other UV wavelengths and mount in the same mechanical system as the 248 nm lens.

Citation Download Citation

Paul Michaloski and Paul Dewa "A Deep UV Imaging System For Lithography And Process Development", Proc. SPIE 0998, Excimer Beam Applications, (16 December 1988); https://doi.org/10.1117/12.960207

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