Aligned multiphoton lithography

Mareike Trappen; Tobias Hoose; Matthias Blaicher; Nicole Lindenmann; Stephan Dottermusch; Philipp Rayling; Kai Sandfort; Fabian Niesler; Michael Thiel

doi:10.1117/12.2609399

5 March 2022 Aligned multiphoton lithography

Mareike Trappen, Tobias Hoose, Matthias Blaicher, Nicole Lindenmann, Stephan Dottermusch, Philipp Rayling, Kai Sandfort, Fabian Niesler, Michael Thiel

Author Affiliations +

Proceedings Volume PC12012, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics XV; PC120120N (2022) https://doi.org/10.1117/12.2609399
Event: SPIE OPTO, 2022, San Francisco, California, United States

Abstract

In this invited presentation we introduce aligned multiphoton lithography (AML®). In contrast to traditional mask(less) aligners based on one-photon lithography, in AML®, 3-dimensional shapes can be generated and aligned to 3-dimensional topographies. The unique resolution and design freedom of AML® opens new horizons for optical applications, hybrid photonic integration, MEMS, medicine, or life science applications. In this session we present the design and fabrication of micro-optical elements aligned to fiber tips, chip edge couplers, and laser output facets. The characterization of these elements is in very good agreement with simulations allowing us to also present experiments demonstrating low-loss coupling between the elements.

Conference Presentation

Citation Download Citation

Mareike Trappen, Tobias Hoose, Matthias Blaicher, Nicole Lindenmann, Stephan Dottermusch, Philipp Rayling, Kai Sandfort, Fabian Niesler, and Michael Thiel "Aligned multiphoton lithography", Proc. SPIE PC12012, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics XV, PC120120N (5 March 2022); https://doi.org/10.1117/12.2609399

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