Adhesion and collapse of EUV photoresists and the role of underlayers

Roberto Fallica; Steven Chen; Danilo De Simone; Hyo Seon Suh

doi:10.1117/12.2609485

13 June 2022 Adhesion and collapse of EUV photoresists and the role of underlayers

Roberto Fallica, Steven Chen, Danilo De Simone, Hyo Seon Suh

Proceedings Volume PC12055, Advances in Patterning Materials and Processes XXXIX; PC1205507 (2022) https://doi.org/10.1117/12.2609485
Event: SPIE Advanced Lithography + Patterning, 2022, San Jose, California, United States

Abstract

Pattern collapse and photoresist scumming reduce lithographic quality with detrimental consequence on the process window, etching and pattern transfer. As extreme ultraviolet (EUV) lithography patterning moves to smaller and smaller technology nodes, these phenomena become increasingly dominant. In this work, we propose a three-interface model that accounts for the collapse and wiggling during development (due to developer infiltration) and rinse and drying (due to capillary force). We introduce a metric W3 (dependant on photoresist thickness, pitch, CD, and linewidth roughness) and demonstrate experimentally that W3 of exposed materials predicts scumming while the W3 of unexposed materials predicts collapse and wiggling.

Conference Presentation

Citation Download Citation

Roberto Fallica, Steven Chen, Danilo De Simone, and Hyo Seon Suh "Adhesion and collapse of EUV photoresists and the role of underlayers", Proc. SPIE PC12055, Advances in Patterning Materials and Processes XXXIX, PC1205507 (13 June 2022); https://doi.org/10.1117/12.2609485

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