Presentation
3 October 2022 Experimental characterization of a high-performance Y-junction enhanced with subwavelength grating metamaterials (Conference Presentation)
Raquel Fernández de Cabo, Jaime Vilas Ramos, Pavel Cheben, Aitor Villafranca Velasco, David González Andrade
Author Affiliations +
Abstract
We present an ultra-broadband, high-performance and fabrication-tolerant Y–junction enhanced with subwavelength grating metamaterials. Exhaustive measurements over a 1420–1680 nm bandwidth show fundamental mode excess loss under 0.3 dB considering a minimum-feature-size of 50 nm and below 0.5 dB for a 100 nm resolution scenario. Subwavelength Y–junctions with artificially induced errors of ±10 nm further demonstrate the fabrication-tolerant response of our design. Moreover, our proposed splitter exhibits first-order transverse electric mode excess loss lower than 1.5 dB within a 170 nm bandwidth (1420–1590 nm) in both 50 nm and 100 nm resolution scenarios.
Conference Presentation
© (2022) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Raquel Fernández de Cabo, Jaime Vilas Ramos, Pavel Cheben, Aitor Villafranca Velasco, and David González Andrade "Experimental characterization of a high-performance Y-junction enhanced with subwavelength grating metamaterials (Conference Presentation)", Proc. SPIE PC12195, Metamaterials, Metadevices, and Metasystems 2022, PC121951J (3 October 2022); https://doi.org/10.1117/12.2631762
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KEYWORDS
Metamaterials

Lithography

Tolerancing

Assembly tolerances

Integrated circuits

Integrated optics

Optical lithography

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