Presentation
4 October 2022 Multi-section coupled cavity mid-IR quantum cascade lasers (Conference Presentation)
Kamil Pierscinski, Dorota Pierscinska, Aleksandr Kuzmicz, Grzegorz Sobczak, Piotr Gutowski, Krzysztof Chmielewski
Author Affiliations +
Abstract
Single mode emission is one of the crucial requirements for Quantum Cascade Lasers (QCLs), which are compact laser sources of infrared radiation in the mid-IR range (3–20 micrometers) and in the THz range (1–5 THz). This feature is particularly important in all spectroscopic applications such as industrial process monitoring, remote sensing, breath analysis for medical diagnostic or industrial process monitoring. In this paper, we have proposed a modified approach to coupled cavity QCLs, based on multisection (three section) coupled cavity QCLs. The range of spectral tuning is very important from the point of view of applications in optical sensing techniques based on the intrapulse tuning of the laser emission. We have designed and fabricated 3-section CC QCLs characterized by intrapulse wavelength tuning of 2.8 cm-1, obtained for 2 mirosecond pulse width. The device operates above room temperature. The improvement of the spectral tuning of 3-section device is compared to 2-section laser. The third section improved significantly the performance of the laser in terms of single mode intrapulse wavelength tuning.
Conference Presentation
© (2022) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Kamil Pierscinski, Dorota Pierscinska, Aleksandr Kuzmicz, Grzegorz Sobczak, Piotr Gutowski, and Krzysztof Chmielewski "Multi-section coupled cavity mid-IR quantum cascade lasers (Conference Presentation)", Proc. SPIE PC12202, Nanoengineering: Fabrication, Properties, Optics, Thin Films, and Devices XIX, PC1220207 (4 October 2022); https://doi.org/10.1117/12.2633658
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KEYWORDS
Quantum cascade lasers

Mid-IR

FT-IR spectroscopy

Laser stabilization

Terahertz radiation

Wavelength tuning

Reactive ion etching

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