Electron-beam lithography as a tool for teaching silicon photonics

Azad Siahmakoun

doi:10.1117/12.2633689

26 September 2022 Electron-beam lithography as a tool for teaching silicon photonics

Azad Siahmakoun

Author Affiliations +

Proceedings Volume PC12213, Optics Education and Outreach VII; PC122130A (2022) https://doi.org/10.1117/12.2633689
Event: SPIE Optical Engineering + Applications, 2022, San Diego, California, United States

Conference Poster

Abstract

As part of the hands-on instruction for the Silicon Photonics course, students make Models, create layout, and fabricate optical devices using electron-beam lithography (EBL) and nano-pattern generating system (NPGS). Devices are written with a JOEL-100 SEM on a resist coated SiN or SOI substrate. The developed patterns are etched with RIE and tested with one of two available probe stations depending on I/O design (grating coupling or edge coupling). We’ll discuss the resulting passive and active devices made by students for this course.

Citation Download Citation

Azad Siahmakoun "Electron-beam lithography as a tool for teaching silicon photonics", Proc. SPIE PC12213, Optics Education and Outreach VII, PC122130A (26 September 2022); https://doi.org/10.1117/12.2633689

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