Inline model-base mask process correction embedded on multi-beam mask writer MBM-2000

Noriaki Nakayamada

doi:10.1117/12.2656164

15 September 2022 Inline model-base mask process correction embedded on multi-beam mask writer MBM-2000

Noriaki Nakayamada

Proceedings Volume PC12325, Photomask Japan 2022: XXVIII Symposium on Photomask and Next-Generation Lithography Mask Technology; PC123250R (2022) https://doi.org/10.1117/12.2656164
Event: Photomask Japan 2022, 2022, Online Only

Conference Poster

Abstract

This poster was prepared for the Photomask Japan 2022: XXVIII Symposium on Photomask and Next-Generation Lithography Mask Technology (2022).

Citation Download Citation

Noriaki Nakayamada "Inline model-base mask process correction embedded on multi-beam mask writer MBM-2000", Proc. SPIE PC12325, Photomask Japan 2022: XXVIII Symposium on Photomask and Next-Generation Lithography Mask Technology, PC123250R (15 September 2022); https://doi.org/10.1117/12.2656164

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