Presentation
17 March 2023 Two steps towards compact 3D laser nanoprinters
Author Affiliations +
Proceedings Volume PC12412, Laser 3D Manufacturing X; PC124120E (2023) https://doi.org/10.1117/12.2649831
Event: SPIE LASE, 2023, San Francisco, California, United States
Abstract
Two-photon induced 3D laser lithography is a widely used technique in additive manufacturing of three-dimensional micro- and nanostructures. However, efficient two-photon absorption (2PA) comes at a cost: It requires femtosecond pulsed laser sources leading to large and expensive setups. Recently, we introduced two-step absorption (2SA) as a novel alternative excitation mechanism[1]. This allows for employing low-power continuous-wave light sources like inexpensive, compact semiconductor laser diodes for excitation. Here, we present a compact setup based on 2SA drastically reduced in cost and size showing the potential in the field of 3D laser lithography. [1] Vincent Hahn, Tobias Messer, N. Maximilian Bojanowski, Ernest Ronald Curticean, Irene Wacker, Rasmus R. Schröder, Eva Blasco, and Martin Wegener, Nat. Photon. 15, 932-938 (2021)
Conference Presentation
© (2023) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Tobias Messer, Matthias Blaicher, Michael Thiel, and Martin Wegener "Two steps towards compact 3D laser nanoprinters", Proc. SPIE PC12412, Laser 3D Manufacturing X, PC124120E (17 March 2023); https://doi.org/10.1117/12.2649831
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KEYWORDS
Absorption

Lithography

Molecules

Semiconductor lasers

Light sources

Micro optics

Microelectromechanical systems

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