Spatial atomic layer deposition: a new revolution in ultra-fast production of conformal oxide-based optical coatings (Conference Presentation)

John-Olof Rönn; Sauli Virtanen; Paula Päivike; Philipp Maydannik; Kalle Niiranen; Sami Sneck

doi:10.1117/12.2647299

16 March 2023 Spatial atomic layer deposition: a new revolution in ultra-fast production of conformal oxide-based optical coatings (Conference Presentation)

John-Olof Rönn, Sauli Virtanen, Paula Päivike, Philipp Maydannik, Kalle Niiranen, Sami Sneck

Author Affiliations +

Proceedings Volume PC12422, Oxide-based Materials and Devices XIV; PC124220T (2023) https://doi.org/10.1117/12.2647299
Event: SPIE OPTO, 2023, San Francisco, California, United States

Abstract

We present a new-generation atomic layer deposition (ALD) technology that revolutionizes the production of conformal optical coatings: the spatial ALD. In spatial ALD, the substrate is rotated across successive process zones to achieve ultra-fast and high-precision thin film deposition. We present our latest results obtained with our novel C2R spatial ALD system, including the fabrication of SiO2, Ta2O5 and Al2O3 with deposition rates reaching > 1 µm/h. We also show that these materials exhibit low surface roughness (<1 Å RMS), low optical loss (<10 ppm @ 1064 nm), excellent uniformity (< 2% over 200 mm) and high damage threshold (up to 40 J/cm2).

Conference Presentation

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John-Olof Rönn, Sauli Virtanen, Paula Päivike, Philipp Maydannik, Kalle Niiranen, and Sami Sneck "Spatial atomic layer deposition: a new revolution in ultra-fast production of conformal oxide-based optical coatings (Conference Presentation)", Proc. SPIE PC12422, Oxide-based Materials and Devices XIV, PC124220T (16 March 2023); https://doi.org/10.1117/12.2647299

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