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Since the initial introduction of the MBMW multi-beam mask writer tool series in 2016, multi-beam technology has continuously improved and matured. Especially for EUV masks multi-beam has become the standard solution due to its superior write performance at mid&low sensitivity resists and its ability to pattern even the most complex curvilinear structures at maximum throughput. In 2023, after the release of evolutionary improvements with MBMW-201 in 2019 and MBMW-261 in 2022, IMS is releasing its third multi-beam tool generation, MBMW-301, to high volume production. MBMW-301 features revolutionary improvements and supports the extension of shrinking into the Angstrom aera. In this paper the performance of MBMW-301 and its advantages over previous multi-beam generations will be discussed.
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