Presentation
5 October 2023 Integration of WSe2 with gate dielectrics: synthesis and interfaces
Author Affiliations +
Abstract
The integration of any new material into device architectures necessarily requires interfaces with dissimilar materials. In the case of semiconducting transition metal dichalcogenide (TMDCs) WSe2 the interface with a gate dielectric is extremely important. Presented will be our work on two approaches to WSe2 integration. The first considers the direct growth of WSe2 on and insulating substrate. Here we consider the impact of the WSe2 on the dielectric itself. In the second approach we investigate the deposition of dielectrics by atomic layer epitaxy onto WSe2 with a focus on enhancing nucleation and the considering the impact of surface functionalization on device performance
Conference Presentation
© (2023) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Stephen McDonnell, Maria Gabriela Sales, Sina Najmaei, Wendy Sarney, and Alex Mazzoni "Integration of WSe2 with gate dielectrics: synthesis and interfaces", Proc. SPIE PC12651, Low-Dimensional Materials and Devices 2023, PC126510D (5 October 2023); https://doi.org/10.1117/12.2683808
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KEYWORDS
Dielectrics

Interfaces

Hafnium

Molecular beam epitaxy

Oxides

Selenium

Semiconductors

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