Process Control for EUV Lithography

doi:10.1117/3.2581446.ch7

Book: Extreme Ultraviolet Lithography

Author(s): Harry J. Levinson

Published: 2020

https://doi.org/10.1117/3.2581446.ch7

Abstract

There are several sources of process variation that are unique to EUV lithography or of significantly greater significance than in optical lithography. The issues for overlay, linewidth control, and defects relevant to EUV lithography are discussed in this chapter. Recently, attention has been given to the subject of edge placement errors, which result from a combination of critical dimension and overlay errors. Although edge placement is the fundamental quantity of interest, overlay and critical dimension control will be considered separately in this chapter so that the causes of process variations can be understood more clearly. Metrology is an important consideration for process control and is the topic of the next chapter.