Metrology for EUV Lithography

doi:10.1117/3.2581446.ch8

Book: Extreme Ultraviolet Lithography

Author(s): Harry J. Levinson

Published: 2020

https://doi.org/10.1117/3.2581446.ch8

Abstract

Much of the metrology for EUV lithography is similar to that for optical lithography, with the caveat that EUV lithography is practiced at very small dimensions. Measurements of overlay and critical dimensions are needed, but since they have the same issues as they did for optical lithography, they will not be discussed in detail in this book. On the other hand, there are aspects of EUV technology without counterparts in optical lithography, mostly related to masks and pellicles, and these have special metrology requirements. Importantly, many metrology tools involve measurement at EUV wavelengths, which necessitates the use of specialized light sources and operation in vacuum.