Antireflective light-blocking layers using a liquid top matte coating

Matthew M. Hamblin; Thane Downing; Sophia Anderson; Erik S. Hamilton; Doyoung Kim; Aaron R. Hawkins

doi:10.1117/1.JMM.17.2.025501

23 April 2018 Antireflective light-blocking layers using a liquid top matte coating

Matthew M. Hamblin, Thane Downing, Sophia Anderson, Erik S. Hamilton, Doyoung Kim, Aaron R. Hawkins

Journal of Micro/Nanolithography, MEMS, and MOEMS, Vol. 17, Issue 2, 025501 (April 2018). https://doi.org/10.1117/1.JMM.17.2.025501

Abstract

Methods exist for the creation of antireflective thin film layers; however, many of these methods depend on the use of high temperatures, harsh chemical etches, or are made with difficult pattern materials, rendering them unusable for many applications. In addition, most methods of light blocking are specifically designed to increase light coupling and absorption in the substrate, making them incompatible with some applications that also require blocking transmission of light. A method of forming a simple, patternable light-blocking layer that drastically reduces both transmission and reflection of light without dependence on processes that could damage underlying structures using a light scattering matte coating over a partially antireflective thin film light-blocking layer is presented.

Citation Download Citation

Matthew M. Hamblin, Thane Downing, Sophia Anderson, Erik S. Hamilton, Doyoung Kim, and Aaron R. Hawkins "Antireflective light-blocking layers using a liquid top matte coating," Journal of Micro/Nanolithography, MEMS, and MOEMS 17(2), 025501 (23 April 2018). https://doi.org/10.1117/1.JMM.17.2.025501

Received: 3 January 2018; Accepted: 30 March 2018; Published: 23 April 2018

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