Patterning of multilayer dielectric optical filters using metal masks fabricated by electroforming and photolithography

Cheng-Chung Jaing; Chii-Rong Yang; Chun-Ming Chang; Chao-Te Lee; Chien-Nan Hsiao

doi:10.1117/1.3222910

1 July 2009 Patterning of multilayer dielectric optical filters using metal masks fabricated by electroforming and photolithography

Cheng-Chung Jaing, Chii-Rong Yang, Chun-Ming Chang, Chao-Te Lee, Chien-Nan Hsiao

Author Affiliations +

Journal of Micro/Nanolithography, MEMS, and MOEMS, Vol. 8, Issue 3, 033009 (July 2009). https://doi.org/10.1117/1.3222910

Abstract

Ni films, replacing photoresists, serve as masks in the selective deposition of optical thin films by electron-beam gun evaporation at a substrate temperature of 300°C. Photolithography is adopted herein to define the growth of Ni films by electroforming. Mosaic patterns with a width of 20 µm are employed as red color filters, which are longwave pass. These red filters are formed from alternate SiO₂ and TiO₂ layers and have a mean transmittance of >90%. The experimental results show that the combined use of photolithography, electroforming, and electron-beam gun evaporation can deposit miniaturized multilayer dielectric coatings with high light transmittance in a hot process.

©(2009) Society of Photo-Optical Instrumentation Engineers (SPIE)

Citation Download Citation

Cheng-Chung Jaing, Chii-Rong Yang, Chun-Ming Chang, Chao-Te Lee, and Chien-Nan Hsiao "Patterning of multilayer dielectric optical filters using metal masks fabricated by electroforming and photolithography," Journal of Micro/Nanolithography, MEMS, and MOEMS 8(3), 033009 (1 July 2009). https://doi.org/10.1117/1.3222910

Published: 1 July 2009

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