Effect of process parameters and packing density on development times for densely packed high-aspect-ratio SU-8 microstructures in x-ray lithography

Kaushal Dhirendra Vora; Bor-Yuan Shew; Erol C. Harvey; J. P. Hayes; Andrew G. Peele

doi:10.1117/1.2712868

1 January 2007 Effect of process parameters and packing density on development times for densely packed high-aspect-ratio SU-8 microstructures in x-ray lithography

Kaushal Dhirendra Vora, Bor-Yuan Shew, Erol C. Harvey, J. P. Hayes, Andrew G. Peele

Author Affiliations +

Journal of Micro/Nanolithography, MEMS, and MOEMS, Vol. 6, Issue 1, 013003 (January 2007). https://doi.org/10.1117/1.2712868

Abstract

We investigate the development time for densely packed high-aspect-ratio SU-8 structures. We find that a simple notch model as used by other workers to predict development time for isolated structures is inadequate for our case. We develop a theoretical model that allows the effects of mass transport of the resist in the developer to be included. By calibrating the process, we find that we are able to predict development time for our structures.

©(2007) Society of Photo-Optical Instrumentation Engineers (SPIE)

Citation Download Citation

Kaushal Dhirendra Vora, Bor-Yuan Shew, Erol C. Harvey, J. P. Hayes, and Andrew G. Peele "Effect of process parameters and packing density on development times for densely packed high-aspect-ratio SU-8 microstructures in x-ray lithography," Journal of Micro/Nanolithography, MEMS, and MOEMS 6(1), 013003 (1 January 2007). https://doi.org/10.1117/1.2712868

Published: 1 January 2007

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