Double-exposure mask synthesis using inverse lithography

Amyn A. Poonawala; Peyman Milanfar

doi:10.1117/1.2794767

1 October 2007 Double-exposure mask synthesis using inverse lithography

Amyn A. Poonawala, Peyman Milanfar

Author Affiliations +

Journal of Micro/Nanolithography, MEMS, and MOEMS, Vol. 6, Issue 4, 043001 (October 2007). https://doi.org/10.1117/1.2794767

Abstract

Inverse lithography mask design and double-exposure lithography are two technologies that have gained a lot of attention in the recent past. Inverse lithography consists of synthesizing the input mask that leads to the desired output wafer pattern by inverting the mathematical forward model from mask to wafer. Double-exposure lithography uses two pairs of mask and exposure to print a single (desired) wafer pattern. It usually involves splitting the latter into two parts. In this work, we present some preliminary results in our unique effort to combine the previous two powerful techniques. The goal is to use the inverse imaging approach to automatically synthesize the masks required to print the desired wafer pattern employing double-exposure lithography. We employ the pixel-based mask representation, analytically calculate the gradient, and use a cyclic coordinate descent optimization algorithm to synthesize the two masks. We present results for chromeless phase-shift masks for an idealized case of a coherent imaging system (σ=0) using the Kirchhoff approximation. The results indicate that our algorithm automatically splits the target pattern into two (overlapping) parts, which are used separately during the individual exposures. Furthermore, the proposed approach is also capable of resolving the phase conflicts. The comparison with a single-exposure case indicates a superior contrast and no hot-spots.

©(2007) Society of Photo-Optical Instrumentation Engineers (SPIE)

Citation Download Citation

Amyn A. Poonawala and Peyman Milanfar "Double-exposure mask synthesis using inverse lithography," Journal of Micro/Nanolithography, MEMS, and MOEMS 6(4), 043001 (1 October 2007). https://doi.org/10.1117/1.2794767

Published: 1 October 2007

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

;

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE