Engineering study of extreme ultraviolet interferometric lithography

Jiang Fan; Yang-Chun Cheng; Artak Isoyan; Franco Cerrina

doi:10.1117/1.3112006

1 April 2009 Engineering study of extreme ultraviolet interferometric lithography

Jiang Fan, Yang-Chun Cheng, Artak Isoyan, Franco Cerrina

Journal of Micro/Nanolithography, MEMS, and MOEMS, Vol. 8, Issue 2, 021203 (April 2009). https://doi.org/10.1117/1.3112006

Abstract

Extreme ultraviolet interferometric lithography (EUV-IL) is a powerful nanopatterning technique, exploiting the interference of two beams of short-wavelength radiation (λ≈13 nm) to form high-accuracy fringe patterns. Transmission diffraction gratings of appropriate period (40−100 nm) are used to form the beams; the substrate is located in the region of overlap to expose the photoresist material, recording 20−50 nm interference fringe patterns. Although the physics of EUV-IL is simple, its actual implementation is not and requires attention to detail in order to fully exploit the power of the technique. In order to understand the impact of realistic physical conditions on the performance of EUV-IL, we have developed a set of accurate numerical models based on the Rayleigh-Sommerfeld diffraction theory. These modeling tools are then applied to generate a complete and accurate analysis of EUV-IL, taking into account all the relevant physical processes, from finite extent of the gratings to the partial coherence of the source, and including detailed physical structure of the mask. The results are used to guide the design and implementation of EUV-IL exposure systems, down to the sub-11-nm range.

©(2009) Society of Photo-Optical Instrumentation Engineers (SPIE)

Citation Download Citation

Jiang Fan, Yang-Chun Cheng, Artak Isoyan, and Franco Cerrina "Engineering study of extreme ultraviolet interferometric lithography," Journal of Micro/Nanolithography, MEMS, and MOEMS 8(2), 021203 (1 April 2009). https://doi.org/10.1117/1.3112006

Published: 1 April 2009

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available