Design of custom photonic crystal cavities using interference lithography in combination with sidelobe-suppressed Bessel beam and optical phase engineering

Amit Kapoor; Joby Joseph

doi:10.1117/1.JNP.11.046024

27 December 2017 Design of custom photonic crystal cavities using interference lithography in combination with sidelobe-suppressed Bessel beam and optical phase engineering

Amit Kapoor, Joby Joseph

Author Affiliations +

Journal of Nanophotonics, Vol. 11, Issue 4, 046024 (December 2017). https://doi.org/10.1117/1.JNP.11.046024

Abstract

We present an experimental technique based on modified multiple beam interference approach to generate various types of photonic crystal (PhC) cavities used in study of nanolasers and cavity quantum electro dynamics. Here, we propose an improvement to the existing method for better realization of PhC cavities and a method to control the hole radius to realize high Q-factors. We used phase-modified Bessel beam of zero and second order and superposed them to get a sidelobe-suppressed Bessel beam. This beam was further interfered with lattice wave field to get defined PhC cavity. We used spatial light modulator-assisted phase-engineered masks with 4F filtering setup to confirm the simulated patterns experimentally.

Citation Download Citation

Amit Kapoor and Joby Joseph "Design of custom photonic crystal cavities using interference lithography in combination with sidelobe-suppressed Bessel beam and optical phase engineering," Journal of Nanophotonics 11(4), 046024 (27 December 2017). https://doi.org/10.1117/1.JNP.11.046024

Received: 23 September 2017; Accepted: 17 November 2017; Published: 27 December 2017

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