Laser-induced damage in pellicles at 193 nm

Mordechai Rothschild; Jan H. C. Sedlacek

doi:10.1117/12.146852

1 October 1993 Laser-induced damage in pellicles at 193 nm

Mordechai Rothschild, Jan H. C. Sedlacek

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Optical Engineering, Vol. 32, Issue 10, (October 1993). https://doi.org/10.1117/12.146852

Abstract

he effect of 1 93-nm excimer laser radiation on pellicles designed for 248-nm use is studied. The pellicles are transparent at 1 93 nm as well. However, prolonged irradiation causes gradual thinning and eventual rupture of the pellicle. The rate of change depends on the fluence and on the total dose but is not affected by the presence of atmospheric oxygen. Two-photon absorption plays an important role in the interaction between the laser and the pellicle material. Extrapolation to the approximately 0.1 mJ cm2lpulse fluences expected to be used in 1 93-nm steppers indicates that these pellicles will change little for 5everal years in a full-production environment.

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Mordechai Rothschild and Jan H. C. Sedlacek "Laser-induced damage in pellicles at 193 nm," Optical Engineering 32(10), (1 October 1993). https://doi.org/10.1117/12.146852

Published: 1 October 1993

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