Dc drift reduction in LiNbO3 optical modulators by decreasing the water content of vacuum evaporation deposited SiO2 buffer layers

Hirotoshi Nagata; Masaru Shiroishi; Toshinari Kitanobo; Katsumi Ogura

doi:10.1117/1.601824

1 October 1998 Dc drift reduction in LiNbO3 optical modulators by decreasing the water content of vacuum evaporation deposited SiO2 buffer layers

Hirotoshi Nagata, Masaru Shiroishi, Toshinari Kitanobo, Katsumi Ogura

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Optical Engineering, Vol. 37, Issue 10, (October 1998). https://doi.org/10.1117/1.601824

With increasing demand for LiNbO3 ~LN! optical intensity modulators for fiber communication systems, fine process control of LN device fabrication has become important to increase the fabrication yield and to supply low-priced modulators.

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Hirotoshi Nagata, Masaru Shiroishi, Toshinari Kitanobo, and Katsumi Ogura "Dc drift reduction in LiNbO3 optical modulators by decreasing the water content of vacuum evaporation deposited SiO2 buffer layers," Optical Engineering 37(10), (1 October 1998). https://doi.org/10.1117/1.601824

Published: 1 October 1998

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