Calculations and surface quality measurements of high-asymmetry angle x-ray crystal monochromators for advanced x-ray imaging and metrological applications

Zdenko Zápražný; Dušan Korytár; Matej Jergel; Peter Šiffalovič; Edmund Dobročka; Patrik Vagovič; Claudio Ferrari; Petr Mikulík; Maksym Demydenko; Marek Mikloška

doi:10.1117/1.OE.54.3.035101

2 March 2015 Calculations and surface quality measurements of high-asymmetry angle x-ray crystal monochromators for advanced x-ray imaging and metrological applications

Zdenko Zápražný, Dušan Korytár, Matej Jergel, Peter Šiffalovič, Edmund Dobročka, Patrik Vagovič, Claudio Ferrari, Petr Mikulík, Maksym Demydenko, Marek Mikloška

Author Affiliations +

Optical Engineering, Vol. 54, Issue 3, 035101 (March 2015). https://doi.org/10.1117/1.OE.54.3.035101

Abstract

We present the numerical optimization and the technological development progress of x-ray optics based on asymmetric germanium crystals. We show the results of several basic calculations of diffraction properties of germanium x-ray crystal monochromators and of an analyzer-based imaging method for various asymmetry factors using an x-ray energy range from 8 to 20 keV. The important parameter of highly asymmetric monochromators as image magnifiers or compressors is the crystal surface quality. We have applied several crystal surface finishing methods, including advanced nanomachining using single-point diamond turning (SPDT), conventional mechanical lapping, chemical polishing, and chemomechanical polishing, and we have evaluated these methods by means of atomic force microscopy, diffractometry, reciprocal space mapping, and others. Our goal is to exclude the chemical etching methods as the final processing technique because it causes surface undulations. The aim is to implement very precise deterministic methods with a control of surface roughness down to 0.1 nm. The smallest roughness (∼0.3 nm), best planarity, and absence of the subsurface damage were observed for the sample which was machined using an SPDT with a feed rate of 1 mm/min and was consequently polished using a fine polishing 15-min process with a solution containing SiO₂ nanoparticles (20 nm).

Citation Download Citation

Zdenko Zápražný, Dušan Korytár, Matej Jergel, Peter Šiffalovič, Edmund Dobročka, Patrik Vagovič, Claudio Ferrari, Petr Mikulík, Maksym Demydenko, and Marek Mikloška "Calculations and surface quality measurements of high-asymmetry angle x-ray crystal monochromators for advanced x-ray imaging and metrological applications," Optical Engineering 54(3), 035101 (2 March 2015). https://doi.org/10.1117/1.OE.54.3.035101

Published: 2 March 2015

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

;

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE