Influence of deposition temperature and SiO2 overcoat layer on laser resistance of 532-nm high-reflection coating

Meiping Zhu; Tingting Zeng; Jingping Li; Jian Sun; Kui Yi; Jianda Shao

doi:10.1117/1.OE.57.12.121902

11 September 2018 Influence of deposition temperature and SiO₂ overcoat layer on laser resistance of 532-nm high-reflection coating

Meiping Zhu, Tingting Zeng, Jingping Li, Jian Sun, Kui Yi, Jianda Shao

Author Affiliations +

Funded by: National Natural Science Foundation of China (NSFC), National Science Foundation of China, Youth Innovation Promotion Association of the Chinese Academy of Sciences

Optical Engineering, Vol. 57, Issue 12, 121902 (September 2018). https://doi.org/10.1117/1.OE.57.12.121902

Abstract

In this work, 532-nm high-reflection (HR) coatings have been deposited at different deposition temperatures by electron-beam evaporation technology. The spectral performance, e-field distribution, surface roughness, stoichiometry, as well as the laser resistance of the prepared 532-nm HR coatings are investigated. Experimental results indicate that the LIDT of the 532-nm HR coatings can be greatly influenced by deposition temperature. A relatively high deposition temperature benefits the crystallization and oxidation, and improves the LIDT of the 532-nm HR coatings. In addition, the SiO₂ overcoat layer is also demonstrated to be effective in suppressing the delamination damage morphology and improving the LIDT of the 532-nm HR coatings.

Citation Download Citation

Meiping Zhu, Tingting Zeng, Jingping Li, Jian Sun, Kui Yi, and Jianda Shao "Influence of deposition temperature and SiO₂ overcoat layer on laser resistance of 532-nm high-reflection coating," Optical Engineering 57(12), 121902 (11 September 2018). https://doi.org/10.1117/1.OE.57.12.121902

Received: 23 January 2018; Accepted: 3 July 2018; Published: 11 September 2018

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