Mr. Akihiko Otoguro Profile

Akihiko Otoguro

at Semiconductor Leading Edge Technologies Inc

SPIE Involvement:

Author

Publications (10)

Proceedings Article | 11 April 2006 Paper

Analysis of 193nm immersion specific defects

Akihiko Otoguro, Jeung-Woo Lee, Toshiro Itani, Kiyoshi Fujii, Tomohiro Funakoshi, Tsunehiro Sakai, Kenji Watanabe, Mikio Arakawa, Hitoshi Nakano, Masamichi Kobayashi

Proceedings Volume 6153, 61531P (2006) https://doi.org/10.1117/12.656086

KEYWORDS: Photoresist processing, Bridges, Semiconducting wafers, Scanning electron microscopy, Photography, Immersion lithography, Thin film coatings, Lithography, Crystals, Quartz

Read Abstract +

Proceedings Article | 29 March 2006 Paper

Diffusion mechanism of water for immersion lithography

Minoru Toriumi, Chie Matsubara, Akihiko Otoguro, Toshiro Itani

Proceedings Volume 6153, 615311 (2006) https://doi.org/10.1117/12.656208

KEYWORDS: Diffusion, Polymers, Immersion lithography, Polymer thin films, Water, Solids, Liquids, Molecules, Lithography, Crystals

Read Abstract +

Proceedings Article | 21 March 2006 Paper

Full-field exposure tools for ArF immersion lithography

Jeung-woo Lee, Akihiko Otoguro, Toshiro Itani, Kiyoshi Fujii, Ken-ichi Shiraishi, Tomoharu Fujiwara, Yuki Ishii

Proceedings Volume 6154, 61544I (2006) https://doi.org/10.1117/12.656130

KEYWORDS: Semiconducting wafers, Resonance energy transfer, Standards development, Immersion lithography, Water, Lithography, Optical lithography, Photoresist processing, Photomasks, Microfluidics

Read Abstract +

Proceedings Article | 21 March 2006 Paper

Novel high refractive index fluids for 193nm immersion lithography

Julius Santillan, Akihiko Otoguro, Toshiro Itani, Kiyoshi Fujii, Akifumi Kagayama, Takashi Nakano, Norio Nakayama, Hiroaki Tamatani, Shin Fukuda

Proceedings Volume 6154, 61544Q (2006) https://doi.org/10.1117/12.656089

KEYWORDS: Photoresist materials, Refractive index, Immersion lithography, Absorption, Neodymium, Microfluidics, Fluid dynamics, Interferometry, Lithography, Water

Read Abstract +

Proceedings Article | 4 May 2005 Paper

A new monocyclic fluoropolymer for 157-nm and 193-nm photoresists

Takashi Sasaki, Yoko Takebe, Osamu Yokokoji, Akihiko Otoguro, Kiyoshi Fujii

Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.599162

KEYWORDS: Polymers, Resistance, Transparency, Lithography, Fluorine, Polymerization, Etching, Virtual colonoscopy, Absorption, Photoresist materials

Read Abstract +

Proceedings Article | 14 May 2004 Paper

Fluoropolymers for 157-nm single-layer resists developed using a new etching rate estimation model (KI-Model)

Yasuhide Kawaguchi, Takashi Sasaki, Jun Irisawa, Osamu Yokokoji, Shigeo Irie, Akihiko Otoguro, Toshiro Itani, Kiyoshi Fujii

Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.533907

KEYWORDS: Polymers, Dry etching, Resistance, Etching, Chemical species, Transparency, Fluorine, Plasma etching, Lithography, Absorption

Read Abstract +

Proceedings Article | 14 May 2004 Paper

157-nm resist assessment by a full-field scanner

Akihiko Otoguro, Shigeo Irie, Toshiyuki Ishimaru, Toshifumi Suganaga, Toshiro Itani, Kiyoshi Fujii

Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.535092

KEYWORDS: Line edge roughness, Critical dimension metrology, Polymers, Lithography, Scanning electron microscopy, Semiconducting wafers, Scanners, Absorption, Dry etching, Etching

Read Abstract +

Proceedings Article | 14 May 2004 Paper

A new monocyclic fluropolymer structure for 157-nm photoresists

Yoko Takebe, Masataka Eda, Shinji Okada, Osamu Yokokoji, Shigeo Irie, Akihiko Otoguro, Kiyoshi Fujii, Toshiro Itani

Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.533932

KEYWORDS: Polymers, Transparency, Etching, Resistance, Polymerization, Fluorine, Photoresist materials, Lithography, Chemical species, Microelectromechanical systems

Read Abstract +

Proceedings Article | 14 May 2004 Paper

157-nm single-layer resist based on novel monocyclic fluorinated polymer

Akihiko Otoguro, Shigeo Irie, Toshiro Itani, Kiyoshi Fujii, Yoko Takebe, Yasuhide Kawaguchi, Osamu Yokokoji

Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.535013

KEYWORDS: Polymers, Absorption, Standards development, Etching, Resistance, Lithography, Fluorine, Dry etching, Photomasks, Transparency

Read Abstract +

Proceedings Article | 12 June 2003 Paper

New trilayer resist process using a phenol-capped siloxane-based middle-layer for ArF resist process

Akihiko Otoguro, Satoshi Takechi, Takatoshi Deguchi, Isamu Hanyu

Proceedings Volume 5039, (2003) https://doi.org/10.1117/12.485062

KEYWORDS: Photoresist processing, Reflectivity, Etching, Semiconducting wafers, Particles, Critical dimension metrology, Lithography, Photomasks, Copper, Polymers

Read Abstract +

Showing 5 of 10 publications

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Keywords/Phrases

Search In:

Publication Years