Mr. Andreas Brouwer Profile

Andreas Brouwer

at ASML Netherlands BV

SPIE Involvement:

Author

Publications (1)

This will count as one of your downloads.

You will have access to both the presentation and article (if available).

DOWNLOAD NOW

This content is available for download via your institution's subscription. To access this item, please sign in to your personal account.

Email or Username Forgot your username?

Password Forgot your password?

Show

Keep me signed in

No SPIE account? Create an account

Proceedings Article | 28 November 2023 Presentation + Paper

Measurement of image fading impact on 20P40 contact hole LCDU

Sam Borman, Dominykas Gustas, Hilbert van Loo, Tian Gang, Dorothe Oorschot, Andreas Brouwer, Alberto Colina, Frank Horsten, Tasja van Rhee

Proceedings Volume PC12750, PC127500A (2023) https://doi.org/10.1117/12.2686368

KEYWORDS: Overlay metrology, Simulations, Semiconducting wafers, Scanners, Pupil aberrations, Nanoimprint lithography, Lithography, Light sources and illumination

Read Abstract +

In lithography, Local CD Uniformity (LCDU) is defined as the CD variability of a feature on small length scales (< 10 µm conventionally). It is a dominant contributor to edge placement error (EPE) budgets and therefore has a major impact on product yield. An important factor on LCDU is contrast loss due to aerial image shift with respect to the scanned wafer, commonly known as image fading. This study shows the results of an experiment where the fading effect on LCDU of P40 regular 20 nm contact holes is investigated on an ASML NXE:3400B scanner. Linear fading is introduced via deliberate stage desynchronizations by employing actuated overlay corrections in slit (x-) and scan (y-) directions separately. We observe significantly different LCDU sensitivities of the considered feature to x- and y-fading. The measurements are corroborated by Hyperlith simulations. In these simulations the induced image fading is represented as Z2 and Z3 aberrations of corresponding magnitude for x- and y-directions, respectively. From the resultant image the Normalized Image Log Slope (NILS) is determined, which can then be matched to the LCDU measurements. When other known contributors, such as projection lens fading and illumination pupil variation through the slit width, are taken into account, we are able to accurately reconstruct the experimental LCDU data. This shows that the LCDU sensitivities to linear fading can be successfully determined, which is a step towards EPE-optimized solutions.

My Library

You currently do not have any folders to save your paper to! Create a new folder below.

Folder Name

Folder Description

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Access to the requested content is limited to institutions that have purchased or subscribe to SPIE eBooks. You are receiving this notice because your organization may not have SPIE eBooks access.*

*Shibboleth/Open Athens users─please sign in to access your institution's subscriptions.

To obtain this item, you may purchase the complete book in print or electronic format on SPIE.org.

ORGANIZATIONAL
Sign in with credentials provided by your organization.

Organizational Username

Organizational Password

Show/Hide Password

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

;

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available

Members:

Non-members: ADD TO CART

Keywords/Phrases

Search In:

Publication Years