Dr. Andrzej T. Kudla Profile

Dr. Andrzej T. Kudla

at Institute of Microelectronics and Photonics

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Author

Publications (6)

Proceedings Article | 5 October 2005 Paper

Zr–silicate co-evaporated thin films

J. Ciosek, W. Paszkowicz, A. Kudla, P. Pankowski, U. Stanislawek

Proceedings Volume 5963, 59631M (2005) https://doi.org/10.1117/12.624488

KEYWORDS: Silicon, Annealing, Zirconium, Composites, Refractive index, Thin films, Atomic force microscopy, Oxides, Absorption, Glasses

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Proceedings Article | 29 August 2005 Paper

Determination of the optical properties of thin absorbing layers with spectroscopic ellipsometry and interferometric microscopy

A. Kudla, L. Borowicz

Proceedings Volume 5858, 58580F (2005) https://doi.org/10.1117/12.612629

KEYWORDS: Aluminum, Phase shifts, Interferometry, Optical properties, Metals, Spectroscopic ellipsometry, Ellipsometry, Refractive index, Silicon, Dielectrics

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Proceedings Article | 10 August 2001 Paper

Spectroscopic ellipsometry investigation of influence of high-pressure high-temperature process on optical properties of SiO2-Si structures

Witold Rzodkiewicz, Andrzej Kudla, Andrzej Misiuk, Stanislaw Lasisz

Proceedings Volume 4517, (2001) https://doi.org/10.1117/12.435963

KEYWORDS: Refractive index, Interfaces, Annealing, Surface roughness, Scanning electron microscopy, Data modeling, Silicon, Spectroscopic ellipsometry, Optical properties, Spectroscopy

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Proceedings Article | 10 August 2001 Paper

Spectroellipsometric investigation of GaSb surfaces after their chemical wet etching

Andrzej Kudla, Ewa Papis-Polakowska

Proceedings Volume 4517, (2001) https://doi.org/10.1117/12.435964

KEYWORDS: Gallium antimonide, Wet etching, Etching, Refractive index, Oxides, Spectroscopic ellipsometry, Optical properties, Dielectrics, Surface roughness, Human-computer interaction

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Proceedings Article | 17 April 2001 Paper

Chemical processing of GaSb related to surface preparation and patterning

Ewa Papis-Polakowska, Anna Piotrowska, E. Kaminska, M. Guziewicz, Tadeusz Piotrowski, Andrzej Kudla, A. Wawro

Proceedings Volume 4413, (2001) https://doi.org/10.1117/12.425408

KEYWORDS: Gallium antimonide, Etching, Surface finishing, Polishing, Oxides, Anisotropic etching, Plasma, Dielectrics, Reactive ion etching, Atomic force microscopy

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Showing 5 of 6 publications

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