Dr. Anton Barty Profile

Dr. Anton Barty

at Lawrence Livermore National Lab

SPIE Involvement:

Author

Publications (15)

Proceedings Article | 3 May 2013 Paper

Paper

Characterizing the focus of a multilayer coated off-axis parabola for FLASH beam at λ = 4.3 nm

Adam F. Leontowich, Andrew Aquila, Francesco Stellato, Richard Bean, Holger Fleckenstein, Mauro Prasciolu, Mengning Liang, Daniel DePonte, Anton Barty, Fenglin Wang, Jakob Andreasson, Janos Hajdu, Henry Chapman, Saša Bajt

Proceedings Volume 8777, 87770T (2013) https://doi.org/10.1117/12.2022403

KEYWORDS: Multilayers, Free electron lasers, Photomicroscopy, Polymethylmethacrylate, Optical testing, Signal attenuation, Mirrors, Reflectivity, Photons, X-ray optics

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Proceedings Article | 21 May 2011 Paper

Paper

Single particle imaging with soft x-rays at the Linac Coherent Light Source

Andrew Martin, Jakob Andreasson, Andrew Aquila, Saša Bajt, Thomas R. Barends, Miriam Barthelmess, Anton Barty, W. Henry Benner, Christoph Bostedt, John Bozek, Phillip Bucksbaum, Carl Caleman, Nicola Coppola, Daniel DePonte, Tomas Ekeberg, Sascha Epp, Benjamin Erk, George Farquar, Holger Fleckenstein, Lutz Foucar, Matthias Frank, Lars Gumprecht, Christina Hampton, Max Hantke, Andreas Hartmann, Elisabeth Hartmann, Robert Hartmann, Stephan Hau-Riege, Günther Hauser, Peter Holl, André Hoemke, Olof Jönsson, Stephan Kassemeyer, Nils Kimmel, Maya Kiskinova, Faton Krasniqi, Jacek Krzywinski, Mengning Liang, Ne-Te Duane Loh, Lukas Lomb, Filipe R. N. Maia, Stefano Marchesini, Marc Messerschmidt, Karol Nass, Duško Odic, Emanuele Pedersoli, Christian Reich, Daniel Rolles, Benedikt Rudek, Artem Rudenko, Carlo Schmidt, Joachim Schultz, M. Marvin Seibert, Robert Shoeman, Raymond Sierra, Heike Soltau, Dmitri Starodub, Jan Steinbrener, Francesco Stellato, Lothar Strüder, Martin Svenda, Herbert Tobias, Joachim Ullrich, Georg Weidenspointner, Daniel Westphal, Thomas White, Garth Williams, Janos Hajdu, Ilme Schlichting, Michael Bogan, Henry Chapman

Proceedings Volume 8078, 807809 (2011) https://doi.org/10.1117/12.886754

KEYWORDS: Diffraction, Particles, X-rays, Light sources, Sensors, Liquid crystal lasers, X-ray imaging, X-ray diffraction, Coherence imaging, Free electron lasers

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Proceedings Article | 21 March 2008 Paper

Paper

Determining the critical size of EUV mask substrate defects

Hakseung Han, Wonil Cho, Kenneth Goldberg, Eric Gullikson, Chan-Uk Jeon, Stefan Wurm

Proceedings Volume 6921, 69211Y (2008) https://doi.org/10.1117/12.772590

KEYWORDS: Photomasks, Critical dimension metrology, Extreme ultraviolet lithography, Extreme ultraviolet, Semiconducting wafers, Charge-coupled devices, Inspection, Lithography, Scanners, Line width roughness

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Proceedings Article | 21 March 2008 Paper

Paper

EUV mask reflectivity measurements with micron-scale spatial resolution

Kenneth Goldberg, Senajith Rekawa, Charles Kemp, Anton Barty, Erik Anderson, Patrick Kearney, Hakseung Han

Proceedings Volume 6921, 69213U (2008) https://doi.org/10.1117/12.772971

KEYWORDS: Reflectivity, Inspection, Photomasks, Extreme ultraviolet, Scanning electron microscopy, Signal detection, Signal to noise ratio, Contamination, Optical filters, Extreme ultraviolet lithography

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Proceedings Article | 30 October 2007 Paper

Paper

Performance of actinic EUVL mask imaging using a zoneplate microscope

Kenneth Goldberg, Patrick Naulleau, Anton Barty, Senajith Rekawa, Charles Kemp, Robert Gunion, Farhad Salmassi, Eric Gullikson, Erik Anderson, Hak-Seung Han

Proceedings Volume 6730, 67305E (2007) https://doi.org/10.1117/12.746756

KEYWORDS: Photomasks, Monochromatic aberrations, Semiconducting wafers, Extreme ultraviolet, Contrast transfer function, Extreme ultraviolet lithography, Inspection, Reflectivity, Microscopes, Charge-coupled devices

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Proceedings Article | 13 March 2007 Paper

Paper

EUV and non-EUV inspection of reticle defect repair sites

Kenneth Goldberg, Anton Barty, Phillip Seidel, Klaus Edinger, Rainer Fettig, Patrick Kearney, Hakseung Han, Obert Wood

Proceedings Volume 6517, 65170C (2007) https://doi.org/10.1117/12.712202

KEYWORDS: Extreme ultraviolet, Inspection, Reflectivity, Multilayers, Photomasks, Scattering, Signal attenuation, Light scattering, Scanning electron microscopy, Ultraviolet radiation

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Proceedings Article | 20 October 2006 Paper

Paper

Multilayer defects nucleated by substrate pits: a comparison of actinic inspection and non-actinic inspection techniques

A. Barty, K. Goldberg, P. Kearney, S. Rekawa, B. LaFontaine, O. Wood, J. Taylor, H.-S. Han

Proceedings Volume 6349, 63492M (2006) https://doi.org/10.1117/12.686742

KEYWORDS: Inspection, Photomasks, Extreme ultraviolet, Reflectivity, Multilayers, Signal detection, Imaging systems, Coating, Defect detection, Printing

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Proceedings Article | 8 September 2005 Paper

Paper

Ultra-high-accuracy optical testing: creating diffraction-limited short-wavelength optical systems

Kenneth Goldberg, Patrick Naulleau, Senajith Rekawa, Paul Denham, J. Liddle, Eric Gullikson, Keith Jackson, Erik Anderson, John Taylor, Gary Sommargren, Henry Chapman, Donald Phillion, Michael Johnson, Anton Barty, Regina Soufli, Eberhard Spiller, Christopher Walton, Sasa Bajt

Proceedings Volume 5900, 59000G (2005) https://doi.org/10.1117/12.618066

KEYWORDS: Extreme ultraviolet, Optical testing, Interferometry, EUV optics, X-ray optics, X-rays, Lenses, Light sources, Astronomical imaging, X-ray astronomy

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Proceedings Article | 6 May 2005 Paper

Paper

A dual-mode actinic EUV mask inspection tool

Yanwei Liu, Anton Barty, Eric Gullikson, John Taylor, J. Liddle, Obert Wood

Proceedings Volume 5751, (2005) https://doi.org/10.1117/12.598559

KEYWORDS: Photomasks, Zone plates, Extreme ultraviolet, Inspection, Imaging systems, Multilayers, Defect inspection, EUV optics, Microscopes, Semiconducting wafers

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Proceedings Article | 6 May 2005 Paper

Paper

Actinic inspection of multilayer defects on EUV masks

Anton Barty, Yanwei Liu, Eric Gullikson, John Taylor, Obert Wood

Proceedings Volume 5751, (2005) https://doi.org/10.1117/12.598488

KEYWORDS: Inspection, Photomasks, Extreme ultraviolet, Defect inspection, Signal detection, Defect detection, Visible radiation, Light scattering, Scattering, Extreme ultraviolet lithography

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Proceedings Article | 16 June 2003 Paper

Paper

Defect repair for extreme-ultraviolet lithography (EUVL) mask blanks

Stefan Hau-Riege, Anton Barty, Paul Mirkarimi, Daniel Stearns, Henry Chapman, Donald Sweeney, W. Miles Clift, Eric Gullikson, Moon-Suk Yi

Proceedings Volume 5037, (2003) https://doi.org/10.1117/12.484729

KEYWORDS: Reflectivity, Photomasks, Extreme ultraviolet lithography, Silicon carbide, Multilayers, Carbon, Silicon, Yield improvement, Ion beams, Critical dimension metrology

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Proceedings Article | 16 June 2003 Paper

Paper

Effects of radiation-induced carbon contamination on the performance of an EUV lithographic optic

Anton Barty, Kenneth Goldberg

Proceedings Volume 5037, (2003) https://doi.org/10.1117/12.499372

KEYWORDS: Carbon, Extreme ultraviolet, EUV optics, Contamination, Lithography, Cameras, Visible radiation, Extreme ultraviolet lithography, Wavefronts, Absorption

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Proceedings Article | 27 December 2002 Paper

Paper

Aerial-image microscopes for the inspection of defects in EUV masks

Anton Barty, John Taylor, Russell Hudyma, Eberhard Spiller, Donald Sweeney, Gilbert Shelden, Jan-Peter Urbach

Proceedings Volume 4889, (2002) https://doi.org/10.1117/12.467918

KEYWORDS: Imaging systems, Extreme ultraviolet, Photomasks, Zone plates, Microscopes, Extreme ultraviolet lithography, Objectives, Mirrors, Inspection, EUV optics

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Proceedings Article | 1 July 2002 Paper

Paper

EUVL mask blank repair

Anton Barty, Paul Mirkarimi, Daniel Stearns, Donald Sweeney, Henry Chapman, W. Miles Clift, Scott Hector, Moonsuk Yi

Proceedings Volume 4688, (2002) https://doi.org/10.1117/12.472313

KEYWORDS: Multilayers, Reflectivity, Photomasks, Extreme ultraviolet lithography, Extreme ultraviolet, Silicon, Ion beams, Molybdenum, Particles, Lithography

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Proceedings Article | 1 July 2002 Paper

Paper

100-picometer interferometry for EUVL

Gary Sommargren, D. Phillion, Michael Johnson, Nhan Nguyen, Anton Barty, Franklyn Snell, Daren Dillon, Lloyd Bradsher

Proceedings Volume 4688, (2002) https://doi.org/10.1117/12.472305

KEYWORDS: Extreme ultraviolet lithography, Interferometry, Diffraction, Mirrors, Lithography, Cameras, Aspheric optics, Visible radiation, Phase shifting, CCD cameras

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Showing 5 of 15 publications

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