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Atsushi Okouchi
at Tokyo Electron Kyushu Ltd
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Publications (1)
Proceedings Article | 12 June 2003 Paper
Improvement of CD controllability in developer process
Hideharu Kyoda, Atsushi Okouchi, Hirofumi Takeguchi, Hyun Woo Kim, Taro Yamamoto, Kosuke Yoshihara
Proceedings Volume 5039, (2003) https://doi.org/10.1117/12.485063
KEYWORDS: Critical dimension metrology, Photoresist processing, Semiconducting wafers, Process control, Photomasks, Polymers, Cadmium, Control systems, Liquids, Chemically amplified resists
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