With the advent of novel optical and photonic devices such as Augmented Reality (AR), and Mixed Reality (MR), there is renewed interest in Nanoimprint Lithography (NIL) technology as a cost-effective approach to manufacture key performance enhancing components for these devices, such as surface relief gratings (SRGs) for waveguides. We have developed multiple types of resists for use in NIL for making Surface Relief Gratings (SRGs) for waveguides for AR and MR devices. This paper will discuss the NIL performance of our resists such as high refractive index functional NIL resists, resists for NIL-Etch process as we11 as resists for Bi-layer NIL-Etch approach for patterning high aspect ratio structures. We wi11 discuss various material properties and performance of the NIL resists in NIL process.
The need for remote working technologies driven by the pandemic and the popularity of virtual reality devices is driving a broad interest in augmented reality (AR) devices for enterprise as well as consumer applications. AR devices consist of three key components to deliver a superior augmented experience to users. Waveguides is one of the key components that capture the image/light from the display engine to deliver digital images as well as real world images to user's eyes.
This presentation will discuss how TOK is leveraging its core competencies in designing, engineering, and high volume manufacturing of high purity optical materials for semiconductor manufacturing, to develop novel optical materials that enable creation of structured surfaces for diffractive and meta optical elements for XR devices. We have developed high refractive index, low refractive index, and gap fill/planarization materials that can be applied using several technologies such as spin coating and ink-jet for replication technologies like lithography, nanoimprint lithography to enable AR/XR devices and emerging metaverse.
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