Dr. Benjamin D. Painter Profile

Dr. Benjamin D. Painter

R&D Engineer at Synopsys Inc

SPIE Involvement:

Author

Publications (17)

Proceedings Article | 24 March 2017 Paper

Paper

Correlation of experimentally measured atomic scale properties of EUV photoresist to modeling performance: an exploration

Yudhishthir Kandel, Jonathan Chandonait, Lawrence Melvin, Sajan Marokkey, Qiliang Yan, Steven Grzeskowiak, Benjamin Painter, Gregory Denbeaux

Proceedings Volume 10143, 101430B (2017) https://doi.org/10.1117/12.2258063

KEYWORDS: Extreme ultraviolet lithography, Data modeling, Photoresist materials, Lithography, Optical proximity correction, Optical lithography, High volume manufacturing, Photons, Extreme ultraviolet, Semiconducting wafers, Electron beams, Scattering

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Proceedings Article | 12 April 2013 Paper

Paper

Avoiding wafer-print artifacts in spacer is dielectric (SID) patterning

Gerard Luk-Pat, Ben Painter, Alex Miloslavsky, Peter De Bisschop, Adam Beacham, Kevin Lucas

Proceedings Volume 8683, 868312 (2013) https://doi.org/10.1117/12.2011539

KEYWORDS: Metals, Photomasks, Printing, Optical lithography, Dielectrics, Etching, Lithography, Double patterning technology, Semiconducting wafers, Connectors

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Proceedings Article | 13 March 2012 Paper

Paper

Design compliance for spacer is dielectric (SID) patterning

Gerard Luk-Pat, Alex Miloslavsky, Ben Painter, Li Lin, Peter De Bisschop, Kevin Lucas

Proceedings Volume 8326, 83260D (2012) https://doi.org/10.1117/12.917986

KEYWORDS: Metals, Photomasks, Dielectrics, Optical lithography, Etching, Double patterning technology, Lithography, Photoresist materials, Capacitance, Tolerancing

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Proceedings Article | 7 March 2012 Open Access

Open Access

Paper

Implications of triple patterning for 14nm node design and patterning

Kevin Lucas, Chris Cork, Bei Yu, Gerard Luk-Pat, Ben Painter, David Pan

Proceedings Volume 8327, 832703 (2012) https://doi.org/10.1117/12.920028

KEYWORDS: Optical lithography, Photomasks, Logic, Lithography, Double patterning technology, Etching, Immersion lithography, Cadmium sulfide, Metals, Dielectrics

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Proceedings Article | 10 March 2010 Paper

Paper

Process window and integration results for full-chip model-based assist-feature placement at the 32 nm node and below

Ji Li, Gerard Luk-Pat, Amyn Poonawala, Kevin Lucas, Ben Painter

Proceedings Volume 7640, 76401W (2010) https://doi.org/10.1117/12.848443

KEYWORDS: Atrial fibrillation, Optical proximity correction, Photomasks, Model-based design, Cadmium sulfide, Critical dimension metrology, Manufacturing, Printing, 3D modeling, Solids

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Proceedings Article | 30 September 2009 Paper

Paper

Model-based assist feature placement for 32nm and 22nm technology nodes using inverse mask technology

Amyn Poonawala, Benjamin Painter, Chip Kerchner

Proceedings Volume 7488, 748814 (2009) https://doi.org/10.1117/12.829717

KEYWORDS: Atrial fibrillation, Photomasks, Optical proximity correction, Imaging systems, Data modeling, Manufacturing, Printing, Lithography, Optimization (mathematics), Mathematical modeling

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Proceedings Article | 16 March 2009 Paper

Paper

Integrating assist feature print fixing with OPC

Levi Barnes, Amyn Poonawala, Benjamin Painter, Andrew Jost, TJ Takei, Yong Li

Proceedings Volume 7274, 727413 (2009) https://doi.org/10.1117/12.815171

KEYWORDS: Atrial fibrillation, Optical proximity correction, Printing, 3D modeling, Photomasks, Process modeling, Data modeling, Model-based design, Solids, Optical lithography

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Proceedings Article | 17 October 2008 Paper

Paper

Model-based assist feature placement: an inverse imaging approach

Amyn Poonawala, Benjamin Painter, Jeffrey Mayhew

Proceedings Volume 7122, 71220U (2008) https://doi.org/10.1117/12.801539

KEYWORDS: Atrial fibrillation, Photomasks, Model-based design, Inverse problems, Lithography, Optimization (mathematics), Optical lithography, Phase shifts, Detection and tracking algorithms, Inverse imaging problems

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Proceedings Article | 19 May 2008 Paper

Paper

AF fixer: new incremental OPC method for optimizing assist feature

Sung-Gon Jung, Sang-Wook Kim, Sung-Soo Suh, Young-Chang Kim, Suk-Joo Lee, Sung-Woon Choi, Woo-Sung Han, Joo-Tae Moon, Levi Barnes, Xiaohai Li, Robert Lugg, Sooryong Lee, Kyoil Koo, Munhoe Do, Frank Amoroso, Benjamin Painter

Proceedings Volume 7028, 70280Y (2008) https://doi.org/10.1117/12.793040

KEYWORDS: Atrial fibrillation, Optical proximity correction, Printing, Photomasks, Manufacturing, Scanners, Image segmentation, Process modeling, Optical lithography, Data modeling

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Proceedings Article | 12 March 2008 Paper

Paper

Checking design conformance and optimizing manufacturability using automated double patterning decomposition

Chris Cork, Brian Ward, Levi Barnes, Ben Painter, Kevin Lucas, Gerry Luk-Pat, Vincent Wiaux, Staf Verhaegen, Mireille Maenhoudt

Proceedings Volume 6925, 69251Q (2008) https://doi.org/10.1117/12.774647

KEYWORDS: Double patterning technology, Manufacturing, Optical lithography, Photomasks, Logic, Optical proximity correction, Ultraviolet radiation, Lithography, Semiconducting wafers, Phase shifts

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Delays in equipment availability for both Extreme UV and High index immersion have led to a growing interest in double patterning as a suitable solution for the 22nm logic node. Double patterning involves decomposing a layout into two masking layers that are printed and etched separately so as to provide the intrinsic manufacturability of a previous lithography node with the pitch reduction of a more aggressive node. Most 2D designs cannot be blindly shrunk to run automatically on a double patterning process and so a set of guidelines for how to layout for this type of flow is needed by designers. While certain classes of layout can be clearly identified and avoided based on short range interactions, compliance issues can also extend over large areas of the design and are hard to recognize. This means certain design practices should be implemented to provide suitable breaks or performed with layout tools that are double patterning compliance aware. The most striking set of compliance errors result in layout on one of the masks that is at the minimum design space rather than the relaxed space intended. Another equally important class of compliance errors is that related to marginal printability, be it poor wafer overlap and/or poor process window (depth of focus, dose latitude, MEEF, overlay). When decomposing a layout the tool is often presented with multiple options for where to cut the design thereby defining an area of overlap between the different printed layers. While these overlap areas can have markedly different topologies (for instance the overlap may occur on a straight edge or at a right angled corner), quantifying the quality of a given overlap ensures that more robust decomposition solutions can be chosen over less robust solutions. Layouts which cannot be decomposed or which can only be decomposed with poor manufacturability need to be highlighted to the designer, ideally with indications on how best to resolve this issue. This paper uses an internally developed automated double pattern decomposition tool to investigate design compliance and describes a number of classes of non-conforming layout. Tool results then provide help to the designer to achieve robust design compliant layout.

Proceedings Article | 31 October 2007 Paper

Paper

Improvements in model-based assist feature placement algorithms

Benjamin Painter, Levi Barnes, Jeffrey Mayhew, Yongdong Wang

Proceedings Volume 6730, 67304Y (2007) https://doi.org/10.1117/12.746702

KEYWORDS: Model-based design, Atrial fibrillation, Optical proximity correction, Systems modeling, Image processing, Photomasks, Process modeling, System on a chip, Optical components, Image resolution

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Proceedings Article | 15 May 2007 Paper

Paper

Functionality and performance improvements with field-based OPC

Ben Painter, Kunal Taravade, Levi Barnes, Robert Lugg, Jeff Mayhew, Glenn Newell, Kevin Lucas

Proceedings Volume 6607, 66072T (2007) https://doi.org/10.1117/12.729012

KEYWORDS: Optical proximity correction, Model-based design, Resolution enhancement technologies, Atrial fibrillation, Image segmentation, Semiconducting wafers, Lithography, Tolerancing, Performance modeling, Computer simulations

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Proceedings Article | 21 June 2006 Paper

Paper

Assist feature placement analysis using focus sensitivity models

Lawrence Melvin, Jeffrey Mayhew, Benjamin Painter, Levi Barnes

Proceedings Volume 6281, 62810X (2006) https://doi.org/10.1117/12.692745

KEYWORDS: SRAF, Manufacturing, Process modeling, Performance modeling, Optical lithography, Semiconducting wafers, Image processing, Photomasks, Photoresist materials, Image segmentation

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Proceedings Article | 15 March 2006 Paper

Paper

Model-based placement and optimization of subresolution assist features

Levi Barnes, Benjamin Painter, Lawrence Melvin

Proceedings Volume 6154, 61542C (2006) https://doi.org/10.1117/12.656691

KEYWORDS: Model-based design, SRAF, Photomasks, Process modeling, Semiconducting wafers, Optical proximity correction, Optimization (mathematics), Lithography, Atrial fibrillation, Calibration

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Proceedings Article | 5 November 2005 Paper

Paper

Applying assist features to improve two dimensional feature process robustness

Lawrence Melvin III, Benjamin Painter, Levi Barnes

Proceedings Volume 5992, 59921N (2005) https://doi.org/10.1117/12.629395

KEYWORDS: SRAF, Manufacturing, Model-based design, Photomasks, Photoresist materials, Yield improvement, Reticles, Convolution, Semiconducting wafers, Image processing

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Proceedings Article | 28 May 2004 Paper

Paper

Classical control theory applied to OPC correction segment convergence

Benjamin Painter, Lawrence Melvin, Michael Rieger

Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.537586

KEYWORDS: Control systems, Optical proximity correction, Data modeling, Process control, Data corrections, Image processing, Data centers, Process modeling, Model-based design, Systems modeling

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Proceedings Article | 26 June 2003 Paper

Paper

A methodology to calculate line-end correction feature performance as a function of reticle cost

Lawrence Melvin, James Shiely, Michael Rieger, Benjamin Painter

Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485533

KEYWORDS: Reticles, Lithography, Head, Optical proximity correction, Photomasks, Ear, Mask making, Data corrections, Manufacturing, Performance modeling

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Showing 5 of 17 publications

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