Dr. Bicher H. Haj Ibrahim Profile

Dr. Bicher H. Haj Ibrahim

at Ecole Polytechnique

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Author

Publications (5)

SPIE Journal Paper | 22 June 2016 Open Access

Special Section Guest Editorial:Antonello De Martino (1954–2014): in memoriam

Tatiana Novikova, Bernard Drévillon, Laurent Schwartz, Pierre Validire, André Nazac, Razvigor Ossikovski, Enric Garcia-Caurel, Blandine Laude-Boulesteix, Makrina Anastasiadou, Maria Losurdo, Kurt Hinderl, Bicher Haj Ibrahim, Maria Rosaria Antonelli, Angelo Pierangelo, Stanislas Deby, Stéphane Roussel, Sandeep Manhas, Jérémy Vizet, Dominique Pagnoux, Stéphane Bancelin, Marie-Claire Schanne-Klein, Jean Rehbinder, Huda Haddad, François Moreau, Jean-Charles Vanel, Pere Roca i Cabarrocas, Valery Tuchin, Steven Jacques

JBO, Vol. 21, Issue 07, 071101, (June 2016) https://doi.org/10.1117/12.10.1117/1.JBO.21.7.071101

KEYWORDS: Polarimetry, Biomedical optics, Physics, Infrared radiation, Cervical cancer, Head, Interfaces, Thin films, Scientific research, Quantum optics

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Proceedings Article | 10 September 2011 Paper

Overlay measurement by angle resolved Mueller polarimetry

Clément Fallet, Tatiana Novikova, Aline Jolibois, Bicher Haj Ibrahim, Antonello De Martino, Cyril Vannuffel

Proceedings Volume 8160, 81600J (2011) https://doi.org/10.1117/12.893805

KEYWORDS: Overlay metrology, Polarimetry, Error analysis, Semiconducting wafers, Metrology, Microelectronics, Optical imaging, Objectives, Photomasks, Process control

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SPIE Journal Paper | 1 July 2011

Overlay measurements by Mueller polarimetry in back focal plane

Clément Fallet, Tatiana Novikova, Martin Foldyna, Sandeep Manhas, Bicher Haj Ibrahim, Antonello De Martino, Cyril Vannuffel, Christophe Constancias

JM3, Vol. 10, Issue 03, 033017, (July 2011) https://doi.org/10.1117/12.10.1117/1.3626852

KEYWORDS: Overlay metrology, Polarimetry, Error analysis, Silicon, Semiconducting wafers, Metrology, Optical testing, Microscopes, Critical dimension metrology, Mueller matrices

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Proceedings Article | 20 April 2011 Paper

Overlay measurements by Mueller polarimetry in the back focal plane

Tatiana Novikova, Clément Fallet, Martin Foldyna, Sandeep Manhas, Bicher Haj Ibrahim, Antonello De Martino, Cyril Vannuffel, Christophe Constancias

Proceedings Volume 7971, 797115 (2011) https://doi.org/10.1117/12.879499

KEYWORDS: Overlay metrology, Polarimetry, Metrology, Error analysis, Microscopes, Silicon, Critical dimension metrology, Manufacturing, Semiconducting wafers, Optical testing

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Proceedings Article | 5 October 2005 Paper

Optical thin films deposition by MDECR-PECVD

Bicher Haj Ibrahim, Pavel Bulkin, Dmitri Daineka, Bernard Drévillon

Proceedings Volume 5963, 59631Q (2005) https://doi.org/10.1117/12.624825

KEYWORDS: Gradient-index optics, Ellipsometry, Antireflective coatings, Antennas, Plasma, Glasses, Silicon, Process control, Microwave radiation, Spectroscopy

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