In recent years there have been notable efforts to make two-photon lithography more efficient and faster while avoiding trade-offs in resolution and print quality. The projection two-photon printing scheme achieves high-throughput while maintaining useful feature sizes. However, due to limitations of the temporal focusing process implemented, as well as photoresist kinetics, the resolution of this process does not yet reach that of single focus scanning two-photon lithography. This work explores the photoresist systems used for projection printing and the effect of additional optical beams for enhancing the printing capabilities of two-photon projection printing.
Several methods have recently been proposed for improving the processing speed of the popular two-photon polymerization process. One such method makes use of a spatiotemporal focusing technique to achieve a planar projection printing strategy. This works uses a projection two-photon polymerization process in a continuous fashion to fabricate complex 3D structures at a large print rate while maintaining smooth surface features. Fabrication of millimeter scale structures are achievable with this continuous, layer-by-layer projection two-photon lithography system.
KEYWORDS: Printing, 3D printing, Digital micromirror devices, Ultrafast phenomena, Polymerization, Photoresist materials, Micromirrors, Digital imaging, 3D image processing
Multiphoton polymerization has become a standard for 3D nanofabrication for its superior resolution and processing steps. However, it is often considered limited in its throughput capabilities, resulting in a desire for a more scalable process. An improvement to the speed of 3D nanoprinting via multiphoton polymerization can be achieved through a projection-based method instead of the traditionally serial printing process. Here a printing process using a digital micro-mirror device and spatiotemporal focusing scheme demonstrates a rapid, continuous 3D printing process.
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