Dr. Cong Que Dinh
at TEL Technology Center, America, LLC
SPIE Involvement:
Author
Publications (21)

Proceedings Article | 10 April 2024 Poster
Proceedings Volume 12957, 129571W (2024) https://doi.org/10.1117/12.3010713
KEYWORDS: Extreme ultraviolet, Optical lithography, Etching, Plasma etching, Photoresist materials, Critical dimension metrology, Plasma, Metal oxides, Lithography, High volume manufacturing

Proceedings Article | 10 April 2024 Poster
Proceedings Volume PC12953, PC129530Y (2024) https://doi.org/10.1117/12.3010880
KEYWORDS: Yield improvement, Optical lithography, Extreme ultraviolet, Extreme ultraviolet lithography, Etching, Lithography, Tin, Semiconductors, Integrated circuits, Inspection

Proceedings Article | 9 April 2024 Poster + Paper
Kayoko Cho, Hikari Tomori, Cong Que Dinh, Seiji Nagahara, Arisa Hara, Seiji Fujimoto, Arnaud Dauendorffer, Lior Huli, Kanzo Kato, Nathan Antonovich, Makoto Muramatsu
Proceedings Volume 12957, 129571Q (2024) https://doi.org/10.1117/12.3010231
KEYWORDS: Chemically amplified resists, Extreme ultraviolet, Quenching, Extreme ultraviolet lithography, Line width roughness, Etching, Line edge roughness, Stochastic processes, High volume manufacturing, Semiconductors

Proceedings Article | 9 April 2024 Presentation + Paper
Cong Que Dinh, Seiji Nagahara, Kayoko Cho, Hikari Tomori, Yuhei Kuwahara, Tomoya Onitsuka, Soichiro Okada, Shinichiro Kawakami, Arisa Hara, Seiji Fujimoto, Makoto Muramatsu, Reiko Tsuzuki, Xiang Liu, Arame Thiam, Yannick Feurprier, Kathleen Nafus, Michael Carcasi, Lior Huli, Kanzo Kato, Alexandra Krawicz, Michael Kocsis, Peter De Schepper, Lauren McQuade, Kazuki Kasahara, Jara Garcia Santaclara, Rik Hoefnagels, Bruno La Fontaine, Ryan Miyakawa, Chris Anderson, Patrick Naulleau
Proceedings Volume 12957, 1295705 (2024) https://doi.org/10.1117/12.3010207
KEYWORDS: Extreme ultraviolet lithography, Extreme ultraviolet, Inspection, Tin, Lithography, Etching

Proceedings Article | 28 November 2023 Presentation + Paper
Proceedings Volume PC12750, PC127500G (2023) https://doi.org/10.1117/12.2687901
KEYWORDS: Optical lithography, Extreme ultraviolet lithography, Lithography, Semiconductors, Integrated circuits, Industry, Fiber optic illuminators, Fabrication, Etching

Proceedings Article | 22 November 2023 Poster
Proceedings Volume PC12750, PC1275011 (2023) https://doi.org/10.1117/12.2687568
KEYWORDS: Extreme ultraviolet, Etching, Plasma etching, Photoresist materials, Optical lithography, Critical dimension metrology, Plasma, Metal oxides, Lithography, High volume manufacturing

Proceedings Article | 21 November 2023 Presentation + Paper
Cong Que Dinh, Seiji Nagahara, Kanzo Kato, Shinichiro Kawakami, Yuhei Kuwahara, Soichiro Okada, Kayoko Cho, Hikari Tomori, Junji Nakamura, Shoichi Terada, Makoto Muramatsu, Alexandra Krawicz, Kathleen McInerney, Nathan Antonovich, Lior Huli
Proceedings Volume 12750, 1275009 (2023) https://doi.org/10.1117/12.2687434
KEYWORDS: Extreme ultraviolet lithography, Extreme ultraviolet, Scanners, Photoresist processing, Metals

Proceedings Article | 1 May 2023 Poster + Paper
Proceedings Volume 12498, 124981G (2023) https://doi.org/10.1117/12.2657432
KEYWORDS: Optical lithography, Extreme ultraviolet, Extreme ultraviolet lithography, Interfaces, Etching, Coating thickness, Lithography, Stochastic processes, Critical dimension metrology

Proceedings Article | 1 May 2023 Paper
Cong Que Dinh, Seiji Nagahara, Yuhei Kuwahara, Arnaud Dauendorffer, Soichiro Okada, Seiji Fujimoto, Shinichiro Kawakami, Satoru Shimura, Makoto Muramatsu, Kayoko Cho, Xiang Liu, Kathleen Nafus, Michael Carcasi, Ankur Agarwal, Mark Somervell, Lior Huli, Kanzo Kato, Michael Kocsis, Peter De Schepper, Stephen Meyers, Lauren McQuade, Kazuki Kasahara, Jara Garcia Santaclara, Rik Hoefnagels, Chris Anderson, Patrick Naulleau
Proceedings Volume 12498, 1249806 (2023) https://doi.org/10.1117/12.2655928
KEYWORDS: Extreme ultraviolet lithography, Extreme ultraviolet, Line width roughness, Line edge roughness, Lithography, Etching

Proceedings Article | 1 May 2023 Poster + Paper
Proceedings Volume 12498, 124981F (2023) https://doi.org/10.1117/12.2657076
KEYWORDS: Line width roughness, Extreme ultraviolet lithography, Extreme ultraviolet, Line edge roughness, Etching, Solubility, High volume manufacturing, Silicon carbide, Silicon, Scanning electron microscopy

Proceedings Article | 30 April 2023 Presentation
Eric Liu, Akiteru Ko, Sophie Thibaut, Katie Lutker-Lee, Steven Grzeskowiak, Alexandra Krawicz, Christopher Cole, Hamed Hajibabaei, Sergey Voronin, Nayoung Bae, Angelique Raley, Lior Huli, Kanzo Kato, David Hetzer, Kathleen Nafus, Seiji Fujimoto, Seiji Nagahara, Satoru Shimura, Shinichiro Kawakami, Congque Dinh, Yuhei Kuwahara, Shigeru Tahara, Masanobu Honda, Tetsuya Nishizuka, Peter Biolsi, Hiromasa Mochiki
Proceedings Volume PC12499, PC124990H (2023) https://doi.org/10.1117/12.2659720
KEYWORDS: Etching, Optical lithography, Lithography, Extreme ultraviolet, Plasma etching, Plasma, Transistors, Semiconducting wafers, Photoresist processing, Photochemistry

Proceedings Article | 31 October 2022 Poster
Kanzo Kato, Lior Huli, David Hetzer, Steven Grzeskowiak, Alexandra Krawicz, Nayoung Bae, Satoru Shimura, Shinichiro Kawakami, Yuhei Kuwahara, Cong Que Dinh, Soichiro Okada, Takahiro Kitano, Seiji Nagahara, Akihiro Sonoda
Proceedings Volume PC12292, PC122920Q (2022) https://doi.org/10.1117/12.2642878
KEYWORDS: Extreme ultraviolet, Optical lithography, Lithography, Extreme ultraviolet lithography, Semiconductors, Oxides, Metals, Integrated circuits, Industrial chemicals, Etching

Proceedings Article | 25 May 2022 Presentation + Paper
Angélique Raley, Lior Huli, Steven Grzeskowiak, Katie Lutker-Lee, Alexandra Krawicz, Yannick Feurprier, Eric Liu, Kanzo Kato, Kathleen Nafus, Arnaud Dauendorffer, Nayoung Bae, Josh LaRose, Andrew Metz, Dave Hetzer, Masanobu Honda, Tetsuya Nishizuka, Akiteru Ko, Soichiro Okada, Yasuyuki Ido, Tomoya Onitsuka, Shinichiro Kawakami, Seiji Fujimoto, Satoru Shimura, Cong Que Dinh, Makoto Muramatsu, Peter Biolsi, Hiromasa Mochiki, Seiji Nagahara
Proceedings Volume 12056, 120560A (2022) https://doi.org/10.1117/12.2613063
KEYWORDS: Plasma etching, Etching, Extreme ultraviolet, Optical lithography, Plasma, Focus stacking software, Semiconducting wafers, Photoresist processing, Extreme ultraviolet lithography, Silicon carbide

Proceedings Article | 25 May 2022 Poster + Presentation + Paper
Hiroki Tadatomo, Arnaud Dauendorffer, Tomoya Onitsuka, Hisashi Genjima, Yasuyuki Ido, Soichiro Okada, Yuhei Kuwahara, Arisa Hara, Congque Dinh, Seiji Fujimoto, Shinichiro Kawakami, Makoto Muramatsu, Satoru Shimura, Kathleen Nafus, Noriaki Oikawa, Kenta Ono, Yannick Feurprier, Marc Demand, Ainhoa Romo Negreira, Seiji Nagahara, Blanco Victor, Philippe Foubert, Danilo De Simone
Proceedings Volume 12056, 120560F (2022) https://doi.org/10.1117/12.2614012
KEYWORDS: Etching, Optical lithography, Extreme ultraviolet, Bridges, Extreme ultraviolet lithography, Inspection, Image processing

Proceedings Article | 28 September 2021 Presentation
Arnaud Dauendorffer, Tomoya Onitsuka, Hiroki Tadatomo, Keisuke Yoshida, Takahiro Shiozawa, Hisashi Genjima, Noriaki Nagamine, Yuya Kamei, Soichiro Okada, Shinichiro Kawakami, Makoto Muramatsu, Satoru Shimura, Kathleen Nafus, Noriaki Oikawa, Yannick Feurprier, Marc Demand, Ainhoa Romo Negreira, Seiji Nagahara, Congque Dinh, Luka Kljucar, Danilo De Simone, Philippe Foubert
Proceedings Volume 11854, 118540B (2021) https://doi.org/10.1117/12.2600860
KEYWORDS: Extreme ultraviolet lithography, Optical lithography, Metals, Etching, Stochastic processes, Semiconductors, Semiconductor manufacturing, Resistance, Photomasks, Particles

Proceedings Article | 22 February 2021 Presentation + Paper
Proceedings Volume 11612, 116120L (2021) https://doi.org/10.1117/12.2583922
KEYWORDS: Extreme ultraviolet lithography, Ultraviolet radiation, Floods, Extreme ultraviolet, Stochastic processes, Chemically amplified resists

Proceedings Article | 30 March 2020 Presentation + Paper
Proceedings Volume 11326, 113260A (2020) https://doi.org/10.1117/12.2552166
KEYWORDS: Stochastic processes, Ultraviolet radiation, Extreme ultraviolet lithography, Photoresist processing, Extreme ultraviolet, Optical lithography, Absorption

Proceedings Article | 8 April 2019 Paper
Proceedings Volume 10960, 109600A (2019) https://doi.org/10.1117/12.2515187
KEYWORDS: Stochastic processes, Calibration, Extreme ultraviolet, Line edge roughness, 3D modeling, Extreme ultraviolet lithography, Switching

Proceedings Article | 26 March 2019 Paper
Proceedings Volume 10957, 109571O (2019) https://doi.org/10.1117/12.2515183
KEYWORDS: Modeling and simulation, Calibration, Ultraviolet radiation, Extreme ultraviolet lithography, Stochastic processes, Data modeling, Line width roughness, Extreme ultraviolet, Scanning electron microscopy

Proceedings Article | 24 April 2014 Paper
Proceedings Volume 9048, 90481S (2014) https://doi.org/10.1117/12.2046790
KEYWORDS: Lithography, Floods, Extreme ultraviolet, Ultraviolet radiation, Extreme ultraviolet lithography, Picosecond phenomena, Light sources, Chemically amplified resists, Contamination, Ions

Proceedings Article | 1 April 2013 Paper
Proceedings Volume 8679, 867926 (2013) https://doi.org/10.1117/12.2011650
KEYWORDS: Polymers, Diffusion, Extreme ultraviolet, Lithography, Line width roughness, Extreme ultraviolet lithography, Optical lithography, Semiconducting wafers, Line edge roughness, Nanotechnology

Showing 5 of 21 publications
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