In this presentation, the authors will review the next generation light source with improvement in speckle reduction for improved device performance yield in next generation device nodes. Further improvements in local critical dimension uniformity (LCDU) from improvement optics that significantly reduces speckle. Overall system availability continues to increase due to significant improvements in module lifetimes which continue to contribute to productivity improvements. We continue to focus on reducing the environmental impact through the reduction and eventual elimination of helium gas which reduces supply issue risks. Lastly, we continue to focus on technology improvements that reduces energy consumption to reduce cost and ecological impact.
Development of a drive laser with sufficient output power, high beam quality, and economical cost of consumables is critical to the successful implementation of a laser-produced plasma (LPP) EUV source for HVM applications. Cymer has conducted research on a number of solutions to this critical need. We report our progress on development of a high power system using two gas-discharge power amplifiers and repetition rates exceeding 10 kHz to produce more than 2kW output power with high beam quality. We provide optical performance data and design features of the drive laser as well as a path to output power scaling to meet high volume manufacturing requirements
Semiconductor chip manufacturing is on the verge of a new production process node driving critical feature sizes below 100 nm. The next generation of 193 nm Argon Fluoride laser, the NanoLithTM 7000, has been developed in response to this recent technology development in the lithography industry. The NanoLithTM 7000, offering 20 Watts average output power at 4 kHz repetition rate, is designed to support the highest exposure tool scan speeds for maximum productivity and wafer throughput. Technology improvements to support the move from pilot production to full production will be described. With core technology defined and performance to specification established, attention turns to cost of operation, which is closely tied to module lifetime and reliability. Here we present results of the NanoLithTM 7000 system lifetest tracking all optical performance data over a 4.4 Billion shot. The system is operated in firing modes ranging from 1-4 kHz, and up to 75% duty cycle. Overall system performance measured to date both in the lab and in the field suggests that this laser meets all the production requirements for 193 nm lithography.
By combining the capability of a differential absorption lidar (DIAL) and the excellent characteristics of a micro pulse lidar (MPL) we have designed and tested a micro pulse DIAL system, which could be operated from the ground or airborne platform, to monitor the atmospheric water vapor mixing ratio. To maintain the compact and rugged optical frame work of an MPL it employs a diode pumped tunable Cr:LiSAF laser operating at 825 - 840 nm range, a fiber optic beam delivery system, and an APD photon counting detector. The system parameters were optimized through extensive DIAL simulations, and the design concept was tested by building a breadboard lidar system. Based on the results of the simulations and the performance of the breadboard lidar the Micro Pulse DIAL system design has been refined to (1) minimize scattered laser light -- the major source of signal induced bias, (2) permit near field measurements from less than 400 m, (3) produce a compact, rugged, eye-safe instrument with a day and night operating capability. The lidar system is expected to provide 150 m vertical resolution, high accuracy (approximately 5%), and 3 km range looking up from the ground.
Light scattering at near forward angles has received considerable attention in the past. However, measurements below a scattering angle of 0.1 degree(s) have not previously been made for particle suspensions due to the presence of the unscattered incident light beam. In this paper, we review a new technique for measuring light scattering near, as well as precisely at, a scattering angle of zero degrees. The existence of coherent scattering effects at zero degrees is considered and both theoretical predictions and experimental data are presented.
This paper describes a special architecture which detects edges of an image using the Laplacian of Gaussian (LOG) operator. Since edge detection with the LOG operator is a computation bound problem, the special architecture is designed to do parallel processing. The parallel processing is achieved by using the residue number system (RNS) and the systolic concept. The special architecture consists of an output converter, which converts the residue number to the binary number, and eight processing elements, one for each modular number. Both processing elements and output converter are designed as a systolic array. The 2 micrometers CMOS technology is used to layout the basic logic gates. Using the delay times of these gates, the special architecture is simulated with Verilog-XL. As a result of simulation, a 50 MHz clock is selected as the system clock, which is fast enough to detect edges of an image frame in a TV frame time. Hence, the special architecture can be applied to the real-time vision system.
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