Dr. Christopher C. Walton
Staff Experimental Physicist at Lawrence Livermore National Lab
SPIE Involvement:
Author
Publications (30)

Proceedings Article | 4 October 2022 Presentation + Paper
Chris Walton, Bernard Kozioziemski, Jeffrey Fein, Suzanne Romaine, Julia Vogel
Proceedings Volume 12240, 1224005 (2022) https://doi.org/10.1117/12.2633400
KEYWORDS: Coating, Reflectivity, Multilayers, X-ray optics, X-ray imaging, Plasmas, Optical design, Fusion energy, X-rays, Monte Carlo methods

Proceedings Article | 5 June 2018 Paper
Proceedings Volume 10691, 106910U (2018) https://doi.org/10.1117/12.2314257
KEYWORDS: Reflectivity, Multilayers, Silicon, Interfaces, X-rays, Molybdenum, Silicon carbide, Data modeling, Systems modeling

Proceedings Article | 29 August 2017 Paper
A. Ames, D. Ampleford, C. Bourdon, R. Bruni, K. Kilaru, B. Kozioziemski, M. Pivovaroff, B. Ramsey, S. Romaine, J. Vogel, C. Walton, M. Wu
Proceedings Volume 10399, 103991X (2017) https://doi.org/10.1117/12.2275721
KEYWORDS: Multilayers, X-ray optics, Optical coatings, Laser optics, X-ray characterization, X-rays, Pulsed power, Prototyping, Optical fabrication, X-ray imaging

Proceedings Article | 9 September 2015 Paper
Nicolai Brejnholt, Jay Ayers, Thomas McCarville, Tom Pardini, Louisa Pickworth, David Bradley, Todd Decker, Stefan Hau-Riege, Randal Hill, Michael Pivovaroff, Regina Soufli, Julia Vogel, Chris Walton
Proceedings Volume 9591, 95910J (2015) https://doi.org/10.1117/12.2187150
KEYWORDS: Mirrors, Spatial resolution, National Ignition Facility, Calibration, Multilayers, X-rays, X-ray imaging, Sensors, Reflectivity, Microscopes

Proceedings Article | 10 September 2014 Paper
M. Ayers, L. Pickworth, T. Decker, R. Hill, T. Pardini, T. McCarville, N. Shingleton, C. Smith, C. Bailey, P. Bell, D. Bradley, N. Brejnholt, S. Hau-Riege, M. Pivovaroff, P. Mirkarimi, M. Vitalich, J. Vogel, C. Walton, J. Kilkenny
Proceedings Volume 9211, 92110C (2014) https://doi.org/10.1117/12.2065253
KEYWORDS: Mirrors, Diagnostics, National Ignition Facility, X-rays, Digital Light Processing, X-ray imaging, Image filtering, Optical alignment, Microscopes, Sensors

Proceedings Article | 27 September 2013 Paper
Regina Soufli, Mónica Fernández-Perea, Jeff Robinson, Sherry Baker, Jennifer Alameda, Christopher Walton, Luis Rodríguez-De Marcos, Jose Méndez, Juan Larruquert, Manuela Vidal-Dasilva, Eric Gullikson
Proceedings Volume 8849, 88490D (2013) https://doi.org/10.1117/12.2024955
KEYWORDS: Multilayers, Corrosion, Reflectivity, Silicon carbide, Magnesium, Aluminum, Extreme ultraviolet, Transmission electron microscopy, Laser sources, Scanning electron microscopy

Proceedings Article | 26 September 2013 Paper
Tom Pardini, Tom McCarville, Christopher Walton, Todd Decker, Julia Vogel, Paul Mirkarimi, Jennifer Alameda, Randy Hill, Louisa Pickworth, Vladimir Smalyuk, Jay Ayers, Perry Bell, Dave Bradley, Joe Kilkenny, Mike Pivovaroff
Proceedings Volume 8850, 88500E (2013) https://doi.org/10.1117/12.2024133
KEYWORDS: Multilayers, X-ray optics, National Ignition Facility, Diagnostics, Sensors, X-rays, Optical coatings, Optical design, Mirrors, Ray tracing

Proceedings Article | 26 September 2013 Paper
V. Smalyuk, J. Ayers, P. Bell, L. R. Benedetti, D. Bradley, C. Cerjan, J. Emig, B. Felker, S. Glenn, C. Hagmann, J. Holder, N. Izumi, J. Kilkenny, J. Koch, O. Landen, J. Moody, K. Piston, N. Simanovskaia, C. Walton
Proceedings Volume 8850, 88500B (2013) https://doi.org/10.1117/12.2025555
KEYWORDS: X-rays, X-ray imaging, Cameras, Imaging systems, Mirrors, National Ignition Facility, Photons, Sensors, Interference (communication), Multilayers

Proceedings Article | 18 May 2007 Paper
Proceedings Volume 6586, 65860J (2007) https://doi.org/10.1117/12.724786
KEYWORDS: Reflectivity, Mirrors, Multilayers, Free electron lasers, Silicon, X-ray optics, X-rays, X-ray sources, Coating, Optical components

Proceedings Article | 28 June 2006 Paper
Proceedings Volume 6272, 62722N (2006) https://doi.org/10.1117/12.672733
KEYWORDS: Mirrors, Actuators, Metals, Lithography, Silicon, Epoxies, Nickel, Deformable mirrors, Semiconducting wafers, Adhesives

Proceedings Article | 23 January 2006 Paper
Proceedings Volume 6113, 61130P (2006) https://doi.org/10.1117/12.657667
KEYWORDS: Actuators, Microelectromechanical systems, Mirrors, Metals, Deformable mirrors, Electrodes, Gold, Silicon, Prototyping, Sputter deposition

Proceedings Article | 8 September 2005 Paper
Proceedings Volume 5900, 59000G (2005) https://doi.org/10.1117/12.618066
KEYWORDS: Extreme ultraviolet, Optical testing, Interferometry, EUV optics, X-ray optics, X-rays, Lenses, Light sources, Astronomical imaging, X-ray astronomy

Proceedings Article | 29 January 2004 Paper
Proceedings Volume 5168, (2004) https://doi.org/10.1117/12.506175
KEYWORDS: Multilayers, Reflectivity, Extreme ultraviolet, Iron, X-rays, Silicon, Optical coatings, Absorption, Solar processes, EUV optics

Proceedings Article | 16 June 2003 Paper
Patrick Naulleau, Kenneth Goldberg, Erik Anderson, Jeffrey Bokor, Bruce Harteneck, Keith Jackson, Deirdre Olynick, Farhad Salmassi, Sherry Baker, Paul Mirkarimi, Eberhard Spiller, Christopher Walton, Donna O'Connell, Pei-Yang Yan, Guojing Zhang
Proceedings Volume 5037, (2003) https://doi.org/10.1117/12.490129
KEYWORDS: Lithography, Extreme ultraviolet, Printing, Photomasks, EUV optics, Wafer-level optics, Semiconducting wafers, Extreme ultraviolet lithography, Mirrors, Fiber optic illuminators

Proceedings Article | 16 June 2003 Paper
Proceedings Volume 5037, (2003) https://doi.org/10.1117/12.484970
KEYWORDS: Particles, Semiconducting wafers, Photomasks, Ion beams, Coating, Extreme ultraviolet lithography, Optical spheres, Ions, Atmospheric particles, Multilayers

Proceedings Article | 27 December 2002 Paper
Proceedings Volume 4889, (2002) https://doi.org/10.1117/12.468199
KEYWORDS: Inspection, Extreme ultraviolet, Photomasks, Defect detection, Particles, Gold, Extreme ultraviolet lithography, Semiconducting wafers, Optical spheres, Multilayers

Proceedings Article | 1 July 2002 Paper
Patrick Naulleau, Kenneth Goldberg, Erik Anderson, David Attwood, Phillip Batson, Jeffrey Bokor, Paul Denham, Eric Gullikson, Bruce Harteneck, Brian Hoef, Keith Jackson, Deirdre Olynick, Senajith Rekawa, Farhad Salmassi, Kenneth Blaedel, Henry Chapman, Layton Hale, Regina Soufli, Eberhard Spiller, Donald Sweeney, John Taylor, Christopher Walton, Avijit Ray-Chaudhuri, Donna O'Connell, Richard Stulen, Daniel Tichenor, Charles Gwyn, Pei-yang Yan, Guojing Zhang
Proceedings Volume 4688, (2002) https://doi.org/10.1117/12.472318
KEYWORDS: Printing, Extreme ultraviolet, Lithography, Fiber optic illuminators, Interferometry, Mirrors, Reticles, Modulation transfer functions, Wavefronts, Critical dimension metrology

Proceedings Article | 1 July 2002 Paper
James Folta, J. Courtney Davidson, Cindy Larson, Christopher Walton, Patrick Kearney
Proceedings Volume 4688, (2002) https://doi.org/10.1117/12.472287
KEYWORDS: Photomasks, Ions, Extreme ultraviolet lithography, Semiconducting wafers, Multilayers, Ion beams, Etching, Silicon, Coded apertures, Molybdenum

Proceedings Article | 20 August 2001 Paper
Regina Soufli, Eberhard Spiller, Mark Schmidt, Courtney Davidson, R. Fred Grabner, Eric Gullikson, Benjamin Kaufmann, Stanley Mrowka, Sherry Baker, Henry Chapman, Russell Hudyma, John Taylor, Christopher Walton, Claude Montcalm, James Folta
Proceedings Volume 4343, (2001) https://doi.org/10.1117/12.436695
KEYWORDS: Multilayers, Mirrors, Reflectivity, Optical coatings, Extreme ultraviolet lithography, Scattering, Extreme ultraviolet, Light scattering, Imaging systems, Cameras

Proceedings Article | 22 January 2001 Paper
Proceedings Volume 4186, (2001) https://doi.org/10.1117/12.410754
KEYWORDS: Photomasks, Extreme ultraviolet lithography, Multilayers, Inspection, Coating, Optical lithography, Lithography, Process modeling, Defect detection, Ion beams

Proceedings Article | 21 July 2000 Paper
Christopher Walton, Patrick Kearney, Paul Mirkarimi, Joel Bowers, Charles Cerjan, Abbie Warrick, Karl Wilhelmsen, Eric Fought, Craig Moore, Cindy Larson, Sherry Baker, Scott Burkhart, Scott Hector
Proceedings Volume 3997, (2000) https://doi.org/10.1117/12.390088
KEYWORDS: Coating, Photomasks, Extreme ultraviolet lithography, Multilayers, Semiconducting wafers, Silicon, Gold, Optical spheres, Reflectivity, Defect detection

Proceedings Article | 21 July 2000 Paper
Proceedings Volume 3997, (2000) https://doi.org/10.1117/12.390080
KEYWORDS: Inspection, Extreme ultraviolet, Photons, Photomasks, Extreme ultraviolet lithography, Interference (communication), Mirrors, Defect inspection, Scattering, Particles

Proceedings Article | 21 July 2000 Paper
Proceedings Volume 3997, (2000) https://doi.org/10.1117/12.390038
KEYWORDS: Photomasks, Extreme ultraviolet lithography, Semiconducting wafers, Silicon, Manufacturing, Printing, Distortion, Lithography, Extreme ultraviolet, Reflectivity

Proceedings Article | 30 December 1999 Paper
Proceedings Volume 3873, (1999) https://doi.org/10.1117/12.373375
KEYWORDS: Extreme ultraviolet lithography, Extreme ultraviolet, Inspection, Scattering, Photomasks, Sensors, Scanners, Signal detection, Defect inspection, Multilayers

Proceedings Article | 30 December 1999 Paper
Gregory Cardinale, John Goldsmith, Avijit Ray-Chaudhuri, Aaron Fisher, Scott Hector, Pawitter Mangat, Zorian Masnyj, David Mancini, Bill Wilkinson, Jeffrey Bokor, Seongtae Jeong, Scott Burkhart, Charles Cerjan, Christopher Walton, Cindy Larson, Pei-yang Yan, Guojing Zhang
Proceedings Volume 3873, (1999) https://doi.org/10.1117/12.373339
KEYWORDS: Photomasks, Extreme ultraviolet lithography, Extreme ultraviolet, Multilayers, Inspection, Chromium, Scanning electron microscopy, Reticles, Silicon films, Printing

Proceedings Article | 23 November 1999 Paper
Claude Montcalm, R. Fred Grabner, Russell Hudyma, Mark Schmidt, Eberhard Spiller, Christopher Walton, Marco Wedowski, James Folta
Proceedings Volume 3767, (1999) https://doi.org/10.1117/12.371119
KEYWORDS: Reflectivity, Multilayers, Coating, Extreme ultraviolet, Extreme ultraviolet lithography, Projection systems, Lithography, Optical components, Mirrors, EUV optics

Proceedings Article | 25 June 1999 Paper
Scott Burkhart, Charles Cerjan, Patrick Kearney, Paul Mirkarimi, Christopher Walton, Avijit Ray-Chaudhuri
Proceedings Volume 3676, (1999) https://doi.org/10.1117/12.351130
KEYWORDS: Photomasks, Multilayers, Silicon, Extreme ultraviolet, Semiconducting wafers, Particles, Extreme ultraviolet lithography, Reflectivity, Scanning electron microscopy, Inspection

Proceedings Article | 25 June 1999 Paper
James Folta, Sasa Bajt, Troy Barbee, R. Fred Grabner, Paul Mirkarimi, Tai Nguyen, Mark Schmidt, Eberhard Spiller, Christopher Walton, Marco Wedowski, Claude Montcalm
Proceedings Volume 3676, (1999) https://doi.org/10.1117/12.351156
KEYWORDS: Multilayers, Reflectivity, Extreme ultraviolet lithography, Optical coatings, Extreme ultraviolet, Mirrors, EUV optics, Lithography, Projection systems, Silicon

Proceedings Article | 23 April 1999 Paper
M. Bujak, Scott Burkhart, Charles Cerjan, Patrick Kearney, Craig Moore, Shon Prisbrey, Donald Sweeney, William Tong, Stephen Vernon, Christopher Walton, Abbie Warrick, Frank Weber, Marco Wedowski, Karl Wilhelmsen, Jeffrey Bokor, Sungho Jeong, Gregory Cardinale, Avijit Ray-Chaudhuri, Alan Stivers, Edita Tejnil, Pei-yang Yan, Scott Hector, Khanh Nguyen
Proceedings Volume 3665, (1999) https://doi.org/10.1117/12.346225
KEYWORDS: Photomasks, Extreme ultraviolet lithography, Semiconducting wafers, Multilayers, Reflectivity, Extreme ultraviolet, Silicon, Inspection, Optical lithography, Ion beams

Proceedings Article | 27 May 1996 Paper
Christopher Walton, Francois Genin, Robert Chow, Mark Kozlowski, Gary Loomis, Edward Pierce
Proceedings Volume 2714, (1996) https://doi.org/10.1117/12.240406
KEYWORDS: Laser damage threshold, Silica, Polarization, Atomic force microscopy, Interfaces, Reflectors, Laser induced damage, Multilayers, Coating, Resistance

Showing 5 of 30 publications
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