Clovis Alleaume
Engineer at ASML Netherlands BV
SPIE Involvement:
Author
Publications (4)

Proceedings Article | 12 April 2013 Paper
A. Szucs, J. Planchot, V. Farys, E. Yesilada, C. Alleaume, L. Depre, R. Dover, C. Gourgon, M. Besacier, A. Nachtwein, P. Rusu
Proceedings Volume 8683, 868313 (2013) https://doi.org/10.1117/12.2011114
KEYWORDS: Wavefronts, Photomasks, Calibration, Scanning electron microscopy, Semiconducting wafers, Scanners, Lithography, Metals, Optical proximity correction, Source mask optimization

Proceedings Article | 5 April 2011 Paper
Proceedings Volume 7973, 79731Y (2011) https://doi.org/10.1117/12.881779
KEYWORDS: Zernike polynomials, Source mask optimization, Scanners, Image processing, Optical lithography, Photomasks, Distance measurement, Resolution enhancement technologies, Semiconducting wafers, Monochromatic aberrations

Proceedings Article | 23 March 2011 Paper
Proceedings Volume 7973, 79730T (2011) https://doi.org/10.1117/12.870753
KEYWORDS: Lithography, Etching, Double patterning technology, Optical lithography, Critical dimension metrology, Resolution enhancement technologies, Photomasks, SRAF, Image processing, Logic

Proceedings Article | 1 October 2010 Paper
Proceedings Volume 7823, 782312 (2010) https://doi.org/10.1117/12.864246
KEYWORDS: Source mask optimization, Photovoltaics, Critical dimension metrology, Lithography, Photomasks, Optical proximity correction, Optical lithography, Resolution enhancement technologies, Metals, Visualization

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