Mr. Darren Taylor Profile

Darren Taylor

Reseacher Staff Engineer at Photronics Inc

SPIE Involvement:

Author

Publications (30)

Proceedings Article | 20 October 2006 Paper

Feasibility study of embedded binary masks

Michael Cangemi, Vicky Philipsen, Leonardus Leunissen, Darren Taylor

Proceedings Volume 6349, 63490L (2006) https://doi.org/10.1117/12.686290

KEYWORDS: Photomasks, Electron beam melting, Binary data, Diffraction, Nanoimprint lithography, Polarization, Lithography, Manufacturing, Resolution enhancement technologies, Semiconducting wafers

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Proceedings Article | 19 May 2006 Paper

Mask repair technique assessment and development for the 45nm lithographic node

H. Marchman, D. Taylor, S. Hadisutjipto, S. Mackay, R. Cottle, J. Maltabes, J. Brown

Proceedings Volume 6283, 628311 (2006) https://doi.org/10.1117/12.681862

KEYWORDS: Photomasks, Ions, Etching, Ion beams, Lithography, Molecules, Electron beams, Image resolution, Scanning electron microscopy, Signal to noise ratio

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Proceedings Article | 5 November 2005 Paper

Simulation-based photomask qualification using i-Virtual Stepper

Darren Taylor, Ray Morgan, Susan Hu

Proceedings Volume 5992, 599217 (2005) https://doi.org/10.1117/12.634666

KEYWORDS: Photomasks, Semiconducting wafers, Inspection, Manufacturing, Lithography, Binary data, Reticles, Computer simulations, Phase shifting, Etching

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Proceedings Article | 6 December 2004 Paper

Chromeless phase lithography reticle defect inspection challenges and solutions

Larry Zurbrick, Anthony Vacca, Byran Reese, Douglas Van Den Broeke, Stephen Hsu, Darren Taylor, Bryan Kasprowicz

Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.569287

KEYWORDS: Inspection, Reticles, Manufacturing, Photomasks, Etching, Defect detection, Lithography, Quartz, Sensors, Resolution enhancement technologies

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Proceedings Article | 6 December 2004 Paper

AAPSM repair utilizing transparent etch stop layer

Darren Taylor, Michael Cangemi, Matthew Lassiter, Marc Cangemi, Eric Poortinga

Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.566596

KEYWORDS: Etching, Quartz, Photomasks, Manufacturing, Inspection, Phase shifts, Lithography, Software development, Binary data, Scanning electron microscopy

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Proceedings Article | 6 December 2004 Paper

Comprehensive defect detection featuring die-to-database reflected light inspection

Anthony Vacca, Darren Taylor

Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.570529

KEYWORDS: Inspection, Reticles, Defect detection, Manufacturing, Image quality, Defect inspection, Modulation, Photomasks, Lithography, Databases

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Proceedings Article | 20 August 2004 Paper

Investigation of quartz defect printability at the 65-nm node

Eric Poortinga, Darren Taylor

Proceedings Volume 5446, (2004) https://doi.org/10.1117/12.557786

KEYWORDS: Quartz, Photomasks, Etching, Optical lithography, Phase shifts, Lithography, 193nm lithography, Semiconducting wafers, Inspection, Defect inspection

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Proceedings Article | 2 June 2004 Paper

Implementation of a transparent etch stop layer for an improved alternating PSM

Michael Cangemi, Darren Taylor, Matthew Lassiter

Proceedings Volume 5504, (2004) https://doi.org/10.1117/12.568018

KEYWORDS: Etching, Quartz, Manufacturing, Phase shifts, Silica, Photomasks, Standards development, Resolution enhancement technologies, Optics manufacturing, Fluorine

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Proceedings Article | 17 December 2003 Paper

193-nm EAPSM inspection comparison: commercial versus alternative absorber material

Darren Taylor, Matthew Lassiter, Michael Cangemi

Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.518069

KEYWORDS: Inspection, Phase shifts, Photomasks, Manufacturing, Optical properties, Semiconducting wafers, Reticles, Inspection equipment, Etching, Lithography

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Proceedings Article | 17 December 2003 Paper

Comparisons of 9% versus 6% transmission attenuated phase-shift mask for the 65-nm device mode

Patrick Montgomery, Kevin Lucas, Lloyd Litt, Will Conley, Eric Fanucchi, Johannes Van Wingerden, Geert Vandenberghe, Vincent Wiaux, Darren Taylor, Michael Cangemi, Bryan Kasprowicz

Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.518022

KEYWORDS: Photomasks, Inspection, Printing, Reticles, Critical dimension metrology, Optical lithography, Manufacturing, Metals, 193nm lithography, Nanoimprint lithography

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Proceedings Article | 17 December 2003 Paper

Improved phase uniformity control using a new AAPSM etch stop layer technique

Matthew Lassiter, Michael Cangemi, Darren Taylor

Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.518130

KEYWORDS: Etching, Silica, Phase shifts, Quartz, Photomasks, Refraction, Fluorine, Chemistry, Glasses, Aluminum

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Proceedings Article | 17 December 2003 Paper

Phase degradation characteristics of programmed AAPSM defects with automatic inspection tool sensitivity

Darren Taylor, Eric Poortinga

Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.518065

KEYWORDS: Inspection, Photomasks, Quartz, Defect inspection, Manufacturing, Etching, Semiconducting wafers, Phase shifting, Scanning electron microscopy, Optical lithography

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Proceedings Article | 28 August 2003 Paper

Automatic inspection tool sensitivity with characterization of AAPSM defects

Darren Taylor, Eric Poortinga, Bryan Reese, Blake Gibson

Proceedings Volume 5130, (2003) https://doi.org/10.1117/12.504204

KEYWORDS: Inspection, Defect inspection, Photomasks, Scanning electron microscopy, Manufacturing, Phase shifting, Glasses, 193nm lithography, Lithography, Etching

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Proceedings Article | 26 June 2003 Paper

Dark-field high-transmission chromeless lithography

George Bailey, Neal Callan, Kunal Taravade, John Jensen, Benjamin Eynon, Patrick Martin, Henry Kamberian, Darren Taylor, Rick Farnbach

Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485518

KEYWORDS: Photomasks, Opacity, Scattering, Lithography, Diffraction gratings, Scanning electron microscopy, Manufacturing, Attenuators, Finite element methods, Optical design

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Proceedings Article | 26 June 2003 Paper

Application-specific methods for creating simulation masks

William Howard, Darren Taylor

Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485536

KEYWORDS: Photomasks, Reticles, Lithography, Semiconducting wafers, Image processing, Monte Carlo methods, Diffraction, Manufacturing, Objectives, Transmittance

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Proceedings Article | 27 December 2002 Paper

Imaging 100-nm contacts with high-transmission attenuated phase-shift masks

James Beach, John Petersen, Benjamin Eynon, Darren Taylor, Dave Gerold, Mark Maslow

Proceedings Volume 4889, (2002) https://doi.org/10.1117/12.467763

KEYWORDS: Photomasks, Printing, Phase shifts, Scanners, Electroluminescence, Phase measurement, Lithography, Overlay metrology, Manufacturing, Image processing

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Proceedings Article | 27 December 2002 Paper

Inspection capability of chromeless phase-shift masks for the 90-nm node

Darren Taylor

Proceedings Volume 4889, (2002) https://doi.org/10.1117/12.467507

KEYWORDS: Inspection, Photomasks, Calibration, Lithography, Glasses, Resolution enhancement technologies, Phase shifts, Binary data, Semiconducting wafers, Reticles

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Proceedings Article | 16 August 2002 Paper

Measuring and assessing printability of reticle pinhole defects

Darren Taylor, Anthony Vacca, Larry Zurbrick, William Broadbent, Peter Fiekowsky

Proceedings Volume 4764, (2002) https://doi.org/10.1117/12.479355

KEYWORDS: Reticles, Scanning electron microscopy, Inspection, Semiconducting wafers, Manufacturing, Photomasks, Metrology, Inspection equipment, Calibration, Optics manufacturing

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Proceedings Article | 1 August 2002 Paper

Improved method for measuring and assessing reticle pinhole defects for the 100-nm lithography node

Darren Taylor, Anthony Vacca, Larry Zurbrick

Proceedings Volume 4754, (2002) https://doi.org/10.1117/12.476917

KEYWORDS: Scanning electron microscopy, Reticles, Photomasks, Inspection, Lithography, Semiconducting wafers, Metrology, Printing, Inspection equipment, Lithographic illumination

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Proceedings Article | 1 August 2002 Paper

Processing techniques in the manufacture of 100-nm node and below inspection test reticles

Nicole Cheng, Clyde Su, Frank Chen, Bill Cheng, Darren Taylor

Proceedings Volume 4754, (2002) https://doi.org/10.1117/12.476965

KEYWORDS: Inspection, Manufacturing, Reticles, Photomasks, Chromium, Optical proximity correction, Metrology, Mask making, Defect inspection, Optical resolution

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Proceedings Article | 30 July 2002 Paper

Inspection of chromeless AAPSM

Darren Taylor, Matthew Lassiter, Benjamin Eynon, Douglas Van Den Broeke, J. Fung Chen

Proceedings Volume 4691, (2002) https://doi.org/10.1117/12.474513

KEYWORDS: Photomasks, Inspection, Phase shifts, Quartz, Manufacturing, Lithography, Silica, Semiconducting wafers, Optical lithography, Defect detection

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Proceedings Article | 11 March 2002 Paper

Improved method for measuring and assessing reticle pinhole defects

Darren Taylor, Anthony Vacca, Larry Zurbrick, William Howard, William Broadbent

Proceedings Volume 4562, (2002) https://doi.org/10.1117/12.458300

KEYWORDS: Reticles, Scanning electron microscopy, Inspection, Semiconducting wafers, Manufacturing, Metrology, Lithography, Scanners, Photomasks, Wafer inspection

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Proceedings Article | 11 March 2002 Paper

Comparison of 2D measurement methodologies and their viability in a manufacturing environment

Bryan Kasprowicz, Darren Taylor, Michael Hathorn

Proceedings Volume 4562, (2002) https://doi.org/10.1117/12.458367

KEYWORDS: Scanning electron microscopy, Reticles, Metrology, Semiconducting wafers, Image analysis, Information operations, Manufacturing, Optical proximity correction, Environmental sensing, Image quality

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Proceedings Article | 5 September 2001 Paper

Contact holes: optical area measurement predicts printability and is highly repeatable

Glen Scheid, Darren Taylor, Peter Fiekowsky

Proceedings Volume 4409, (2001) https://doi.org/10.1117/12.438330

KEYWORDS: Photomasks, Semiconducting wafers, Scanning electron microscopy, Optical testing, Wafer-level optics, Metrology, Critical dimension metrology, Reticles, Optical proximity correction, Visible radiation

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Proceedings Article | 5 September 2001 Paper

Mask defect disposition: flux-area measurement of edge, contact, and OPC defects correlates to wafer and enables effective decisions

Peter Fiekowsky, Darren Taylor, David Wang, Chien-Chu Yang, Shu-Chun Lin, L. Tu, K. Lin

Proceedings Volume 4409, (2001) https://doi.org/10.1117/12.438329

KEYWORDS: Photomasks, Semiconducting wafers, Optical proximity correction, Metrology, Scanning electron microscopy, Optical testing, Scanners, Lithography, Defect detection, Calibration

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Proceedings Article | 22 January 2001 Paper

Soft defect printability: correlation to optical flux-area measurements

Darren Taylor, Peter Fiekowsky

Proceedings Volume 4186, (2001) https://doi.org/10.1117/12.410746

KEYWORDS: Photomasks, Semiconducting wafers, Inspection, Optical spheres, Optical testing, Reticles, 3D image processing, Printing, Wafer-level optics, Contamination

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Proceedings Article | 3 February 2000 Paper

Advanced CD error detection with CD SEM disposition

Darren Taylor, Barry Rockwell, Aihua Dong, Anthony Vacca, Waiman Ng, Geoffrey Anderson, William Howard

Proceedings Volume 3996, (2000) https://doi.org/10.1117/12.377115

KEYWORDS: Reticles, Inspection, Critical dimension metrology, Scanning electron microscopy, Semiconducting wafers, Photomasks, Optical metrology, Electrons, Ultraviolet radiation, Calibration

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Proceedings Article | 30 December 1999 Paper

Techniques to detect and analyze photomask CD uniformity errors

Anthony Vacca, Waiman Ng, Geoffrey Anderson, Barry Rockwell, Aihua Dong, Darren Taylor

Proceedings Volume 3873, (1999) https://doi.org/10.1117/12.373316

KEYWORDS: Photomasks, Critical dimension metrology, Inspection, Reticles, Error analysis, Semiconducting wafers, Scanning electron microscopy, Manufacturing, Metrology, Lithography

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Proceedings Article | 30 December 1999 Paper

Techniques to inspect SCALPEL masks

Darren Taylor, William Howard, Richard Kasica, Reginald Farrow, Anthony Novembre, Carlos Caminos, Chester Knurek

Proceedings Volume 3873, (1999) https://doi.org/10.1117/12.373300

KEYWORDS: Charged-particle lithography, Photomasks, Inspection, Lithography, Semiconducting wafers, Calibration, Silicon, Electron beams, Prototyping, Reticles

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Proceedings Article | 18 December 1998 Paper

Advanced mask printability analysis using TINT Virtual Stepper System

Darren Taylor, Richard Eandi

Proceedings Volume 3546, (1998) https://doi.org/10.1117/12.332869

KEYWORDS: Photomasks, Semiconducting wafers, Reticles, Scanning electron microscopy, Imaging systems, Diffusion, Critical dimension metrology, Manufacturing, Raster graphics, Systems modeling

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Showing 5 of 30 publications

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