CONFERENCE PROCEEDINGS
Advanced Search
Dong-Han Lee
at SAMSUNG Electronics Co Ltd
SPIE Involvement:
Author
Publications (3)
SPIE Journal Paper | 29 March 2016
High-order distortion control using a computational prediction method for device overlay
Young Seog Kang, Cedric Affentauschegg, Jan Mulkens, Jang-Sun Kim, Ju Hee Shin, Young Ha Kim, YoungSun Nam, Young-Sin Choi, Hunhwan Ha, Dong-Han Lee, Jae-il Lee, Umar Rizvi, Bernd Geh, Rob van der Heijden, Jan Baselmans, Oh-Sung Kwon
JM3, Vol. 15, Issue 02, 021403, (March 2016) https://doi.org/10.1117/12.10.1117/1.JMM.15.2.021403
KEYWORDS: Overlay metrology, Metrology, Distortion, Control systems, Semiconducting wafers, Scanners, Etching, Information technology, Image processing, Photomasks
Proceedings Article | 15 March 2016 Paper
Intra-lot wafer by wafer overlay control using integrated and standalone metrology combined sampling
Proceedings Volume 9780, 978009 (2016) https://doi.org/10.1117/12.2219922
KEYWORDS: Semiconducting wafers, Overlay metrology, Metrology, Data corrections, Reticles, HVAC controls, Scanners, Time metrology, Data integration, Lithography, Semiconductors, Control systems, Semiconductor manufacturing, Manufacturing, Computer simulations, Content addressable memory
Proceedings Article | 11 December 2009 Paper
In-shot (intra-field) overlay measurement considering overlay mark pattern dependency and illumination source dependency
Proceedings Volume 7520, 752019 (2009) https://doi.org/10.1117/12.839675
KEYWORDS: Overlay metrology, Distortion, Control systems, Reticles, Nonlinear control, Scanners, Image segmentation, Complex systems, Double patterning technology, Optical lithography
SIGN IN TO:
  • View contact details
UPDATE YOUR PROFILE
Is this your profile? Update it now.
Sign into your SPIE.org account
Don’t have a profile and want one?
Create an account on SPIE.org
Advertisement
Advertisement
Back to Top