Mr. Eiichi Kawamura Profile

Eiichi Kawamura

Manager at Fujitsu Labs

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Author

Publications (6)

Proceedings Article | 5 April 2007 Paper

Data sharing system for lithography APC

Eiichi Kawamura, Yoshiharu Teranishi, Masanori Shimabara

Proceedings Volume 6518, 65182S (2007) https://doi.org/10.1117/12.711246

KEYWORDS: Photomasks, Lithography, Data processing, Databases, Process control, Telecommunications, Back end of line, Control systems, Data backup, Scanners

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Proceedings Article | 5 April 2007 Paper

Algorithm for lithography advanced process control system for high-mix low-volume products

Eiichi Kawamura

Proceedings Volume 6518, 651820 (2007) https://doi.org/10.1117/12.711244

KEYWORDS: Process control, Control systems, Lithography, Error analysis, Overlay metrology, Reticles, Critical dimension metrology, Databases, Semiconducting wafers, Antimony

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Proceedings Article | 17 May 2005 Paper

Log data extraction and correlation miner for lithography management system: LMS-LEC

Eiichi Kawamura, Hidetaka Tsuda, Hidehiro Shirai, Satoru Oishi, Hideki Ina

Proceedings Volume 5755, (2005) https://doi.org/10.1117/12.594994

KEYWORDS: Inspection, Lithography, Control systems, Statistical analysis, Mining, Data analysis, Manufacturing, Process control, Data mining, Semiconductors

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Proceedings Article | 16 July 2002 Paper

TIS-WIS interaction characterization on overlay measurement tool

Kenji Hoshi, Eiichi Kawamura, Hiroshi Morohoshi, Hideki Ina, Takanori Fujimura, Hiroyuki Kurita, Joel Seligson

Proceedings Volume 4689, (2002) https://doi.org/10.1117/12.473514

KEYWORDS: Overlay metrology, Semiconducting wafers, Metrology, Monochromatic aberrations, Chemical mechanical planarization, Optical alignment, Wafer-level optics, Tungsten, Metals, Silicon

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Proceedings Article | 5 July 2000 Paper

130-nm KrF lithography for DRAM production with 0.68-NA scanner

Eiichi Kawamura, Kouichi Nagai, Hideyuki Kanemitsu, Yasuko Tabata, Soichi Inoue

Proceedings Volume 4000, (2000) https://doi.org/10.1117/12.389088

KEYWORDS: Photomasks, Lithography, Scanners, Molybdenum, Optical lithography, Line edge roughness, Optical proximity correction, Critical dimension metrology, Photoresist processing, Lithographic illumination

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Proceedings Article | 7 June 1996 Paper

Novel optimization method for antireflection coating

Teruyoshi Yao, Eiichi Kawamura

Proceedings Volume 2726, (1996) https://doi.org/10.1117/12.240925

KEYWORDS: Antireflective coatings, Refractive index, Carbon, Semiconducting wafers, Optical lithography, Logic devices, Reflection, Coating, Yield improvement, Electrodes

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Showing 5 of 6 publications

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