Ellaheh Barzegar
at ASML Netherlands B.V.
SPIE Involvement:
Author
Publications (2)

Proceedings Article | 10 April 2024 Poster + Paper
Proceedings Volume 12955, 129551Y (2024) https://doi.org/10.1117/12.3006277
KEYWORDS: Line edge roughness, Line width roughness, Semiconducting wafers, Scanning electron microscopy, Distortion, Stochastic processes, Metrology, Bias correction, Error analysis

Proceedings Article | 1 December 2022 Presentation + Paper
Roy Anunciado, Jisun Lee, Ellaheh Barzegar, Stefan van der Sanden, Guillaume Schelcher, Stijn Schoofs
Proceedings Volume 12292, 122920J (2022) https://doi.org/10.1117/12.2637772
KEYWORDS: Line edge roughness, Etching, Semiconducting wafers, Optical lithography, Critical dimension metrology, Amorphous silicon, Scanning electron microscopy, Dielectrics, Overlay metrology, Photomasks

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