Dr. Engelbert Mittermeier Profile

Dr. Engelbert Mittermeier

at Qimonda AG

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Author

Publications (3)

Proceedings Article | 3 May 2007 Paper

A novel model building flow for the simulation of proximity effects of mask processes

Jonathan Mas, Engelbert Mittermeier

Proceedings Volume 6533, 65331N (2007) https://doi.org/10.1117/12.736549

KEYWORDS: Photomasks, Data modeling, Statistical modeling, Process modeling, Mathematical modeling, Electron beams, Critical dimension metrology, Optical proximity correction, Electron beam lithography, Modeling

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Proceedings Article | 27 March 2007 Paper

Golden curve method for OPC signature stability control in high MEEF applications

Katja Geidel, Torsten Franke, Stefan Roling, Peter Buck, Martin Sczyrba, Engelbert Mittermeier, Russell Cinque

Proceedings Volume 6520, 652040 (2007) https://doi.org/10.1117/12.712867

KEYWORDS: Photomasks, Optical proximity correction, Critical dimension metrology, Semiconducting wafers, Metrology, Lithography, Manufacturing, Control systems, Image processing, Etching

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Proceedings Article | 5 November 2005 Paper

Comparison of different approaches for the correction of residual mask proximity effects

E. Mittermeier, T. Franke

Proceedings Volume 5992, 59925I (2005) https://doi.org/10.1117/12.637363

KEYWORDS: Photomasks, SRAF, Lithography, Process modeling, Optical lithography, Data modeling, Semiconducting wafers, Optical simulations, Data corrections, Manufacturing

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