Mr. Eric Janda Profile

Eric Janda

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Publications (6)

Proceedings Article | 10 April 2024 Poster + Paper

Diffraction-based metrology for dose monitoring and control

Young Sung Kim, JongHyun Lee, SangHyun Lee, Kwangseok Maeng, JaeHyoung Kim, InSung Kim, SungWoon Uh, Eric Janda, Ajinkya Patil, SuYeun Baek, SeongYong Cho, James Lee

Proceedings Volume 12955, 129553E (2024) https://doi.org/10.1117/12.3010991

KEYWORDS: Semiconducting wafers, Metrology, Critical dimension metrology, Diffraction, Scanners, Dose control, Design, Wafer level optics, Optical sensing, Diffraction gratings

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Proceedings Article | 20 March 2020 Presentation + Paper

Novel on-product focus metrology for EUV enabling direct focus monitoring and control for EUV systems

Inbeom Yim, Koshiba Dakeshi, Chan Hwang, Seung Yoon Lee, Jeongjin Lee, Joonsoo Park, Jenny Yueh, Ali Ghavami, Bart Segers, Miguel Garcia Granda, Yutao Gui, Eric Janda, Frank Staals, Se-Hui Lee, Seung-Bin Yang, Yoon-Tae Lee, Se-Ra Jeon, Daniel Park, Ewoud van West, Elliott McNamara

Proceedings Volume 11325, 113251U (2020) https://doi.org/10.1117/12.2553246

KEYWORDS: Metrology, Extreme ultraviolet, Semiconducting wafers, Control systems, Scanners, Logic, Extreme ultraviolet lithography, Deep ultraviolet, Diffraction

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Proceedings Article | 18 March 2015 Paper

Solution for high-order distortion on extreme illumination condition using computational prediction method

Young-Seog Kang, Hunhwan Ha, Jang-Sun Kim, Ju Hee Shin, Young Ha Kim, Young Sun Nam, Young-Sin Choi, Cedric Affentauschegg, Rob van der Heijden, Umar Rizvi, Bernd Geh, Eric Janda, Jan Baselmans, Stefan van der Sanden, Oh-Sung Kwon, Mariya Ponomarenko, Daan Slotboom

Proceedings Volume 9426, 942608 (2015) https://doi.org/10.1117/12.2086938

KEYWORDS: Overlay metrology, Distortion, Etching, Metrology, Image processing, Instrument modeling, Data modeling, Calibration, Photomasks, Measurement devices

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Proceedings Article | 13 March 2012 Paper

Overlay metrology for low-k1: challenges and solutions

Jens Neumann, Jongsu Lee, Kiho Yang, Byounghoon Lee, Taehyeong Lee, Jeongsu Park, Chang-moon Lim, Donggyu Yim, Sungki Park, Eric Janda, Kaustuve Bhattacharyya, Chan-ho Ryu, Young-Hong Min, Kiki Rhe, Bernd Geh

Proceedings Volume 8326, 832602 (2012) https://doi.org/10.1117/12.916376

KEYWORDS: Overlay metrology, Diffraction, Data modeling, Metrology, Diffraction gratings, Lithography, Semiconducting wafers, Inspection, Printing, Computer simulations

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Proceedings Article | 4 March 2010 Paper

Simulation-based pattern matching using scanner metrology and design data to reduce reliance on CD metrology

Yuan He, Erik Byers, Scott Light, Danielle Hines, Anton Devilliers, Mike Hyatt, Jianming Zhou, Vinay Nair, Zongchang Yu, Yu Cao, Xu Xie, Wenjin Shao, Rafael Aldana, Ronald Goossens, Chang-Qun Ma, Junwei Lu, Hua-yu Liu, Chris Aquino, Peter Engblom, Tjitte Nooitgedagt, Eric Janda

Proceedings Volume 7640, 764014 (2010) https://doi.org/10.1117/12.848255

KEYWORDS: Scanners, Wafer-level optics, Semiconducting wafers, Metrology, Data modeling, Calibration, Critical dimension metrology, Optics manufacturing, Performance modeling, Optical simulations

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Proceedings Article | 16 March 2009 Paper

Process transfer strategies between ASML immersion scanners

Yuan He, Peter Engblom, Jianming Zhou, Eric Janda, Anton Devilliers, Bernd Geh, Erik Byers, Jasper Menger, Steve Hansen, Mircea Dusa

Proceedings Volume 7274, 72742P (2009) https://doi.org/10.1117/12.816417

KEYWORDS: Scanners, Printing, Semiconducting wafers, Reticles, Calibration, Metrology, Scatterometry, Data modeling, Cadmium, Scanning electron microscopy

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Showing 5 of 6 publications

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