Ms. Eun-Mi Lee Profile

Eun-Mi Lee

at SAMSUNG Electronics Co Ltd

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Author

Publications (9)

Proceedings Article | 22 March 2010 Paper

Comparison of OPC models with and without 3D-mask effect

Jung-Hoon Ser, Tae-Hoon Park, Moon-Gyu Jeong, Eun-Mi Lee, Sung-Woo Lee, Chun-Suk Suh, Seong-Woon Choi, Chan-Hoon Park, Joo-Tae Moon

Proceedings Volume 7640, 76401T (2010) https://doi.org/10.1117/12.848317

KEYWORDS: 3D modeling, Optical proximity correction, Photomasks, Cadmium, Semiconducting wafers, Scanning electron microscopy, Semiconductors, Electronics, Scanners, Lithography

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Proceedings Article | 14 March 2006 Paper

Toward DFM: process worthy design and OPC through verification method using MEEF, TF-MEEF, and MTT

In-Sung Kim, Sungsoo Suh, Sunggon Jung, Eunmi Lee, Young-Seog Kang, Sukjoo Lee, Sang-Gyun Woo, HanKu Cho

Proceedings Volume 6156, 61560L (2006) https://doi.org/10.1117/12.655482

KEYWORDS: Optical proximity correction, Design for manufacturing, Photomasks, Semiconducting wafers, Visualization, Image quality, Lithography, Manufacturing, Image processing, Critical dimension metrology

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Proceedings Article | 23 February 2006 Paper

The UTCOMS: a wireless video capsule nanoendoscope

Mike Lee, Eun-Mi Lee, Byung Lok Cho, Kamran Eshraghian, Yun-Hyun Kim

Proceedings Volume 6082, 60820F (2006) https://doi.org/10.1117/12.639134

KEYWORDS: Antennas, Telecommunications, Control systems, Endoscopes, Video, Wireless communications, Nanotechnology, Surgery, Transceivers, Light emitting diodes

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Proceedings Article | 10 May 2005 Paper

Novel methodology of employing scatterometry to assess optical proximity correction test pattern

S. Suh, I. Kim, E. Lee, Y. Kang, S. Lee, S. Woo, H. Cho

Proceedings Volume 5752, (2005) https://doi.org/10.1117/12.598698

KEYWORDS: Optical proximity correction, Scatterometry, Metrology, Data modeling, Semiconducting wafers, Critical dimension metrology, Model-based design, Optical testing, Inspection, Calibration

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Proceedings Article | 24 May 2004 Paper

Assessments on process parameters' influences to the proximity correction

Eun-Mi Lee, Sung-Woo Lee, Doo-Youl Lee, Soo-Han Choi, Joo-On Park, Sung-Gon Jung, Gi-Sung Yeo, Jung-Hyeon Lee, Han-Ku Cho, Woo-Sung Han

Proceedings Volume 5375, (2004) https://doi.org/10.1117/12.536341

KEYWORDS: Optical proximity correction, Critical dimension metrology, Atrial fibrillation, Cadmium, Resolution enhancement technologies, Data modeling, Logic devices, Photomasks, Line edge roughness, Scanning electron microscopy

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Proceedings Article | 30 July 2002 Paper

Effectiveness and confirmation of local area flare measurement method in various pattern layouts

Dongseok Nam, Eunmi Lee, Sung-gon Jung, Young Kang, Gisung Yeo, Junghyun Lee, Hanku Cho, Woo-Sung Han, Joo-Tae Moon

Proceedings Volume 4691, (2002) https://doi.org/10.1117/12.474608

KEYWORDS: Contamination, Critical dimension metrology, Scattering, Light scattering, Reticles, Photomasks, Semiconductors, Standards development, Projection systems, Optical lithography

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Proceedings Article | 23 June 2000 Paper

Soft bake effect in 193-nm chemically amplified resist

Moon-Gyu Sung, Young-Mi Lee, Eun-Mi Lee, Young-Soo Sohn, Ilsin An, Hye-Keun Oh

Proceedings Volume 3999, (2000) https://doi.org/10.1117/12.388270

KEYWORDS: Refractive index, Lithography, Chemically amplified resists, Optical properties, Photoresist processing, Semiconducting wafers, Chlorine, Temperature metrology, Diffusion, Silicon

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Proceedings Article | 23 June 2000 Paper

Temperature rising effect of 193-nm chemically amplified resist during postexposure bake

Young-Mi Lee, Moon-Gyu Sung, Eun-Mi Lee, Young-Soo Sohn, Heungin Bak, Hye-Keun Oh

Proceedings Volume 3999, (2000) https://doi.org/10.1117/12.388263

KEYWORDS: Semiconducting wafers, Temperature metrology, Silicon, Quartz, Chemically amplified resists, Scanning electron microscopy, Cerium, Photoresist materials, Lithography, Process control

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Proceedings Article | 11 June 1999 Paper

Refractive index change during exposure for 193-nm chemically amplified resists

Hye-Keun Oh, Young-Soo Sohn, Moon-Gyu Sung, Young-Mi Lee, Eun-Mi Lee, Sung Hwan Byun, Ilsin An, Kun-Sang Lee, In-Ho Park

Proceedings Volume 3678, (1999) https://doi.org/10.1117/12.350249

KEYWORDS: Refractive index, Transmittance, Chemically amplified resists, Lithography, Picture Archiving and Communication System, Cesium, Thin films, Excimer lasers, Absorption, Photoresist processing

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Showing 5 of 9 publications

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