Dr. Gunter Antesberger Profile

Dr. Gunter Antesberger

at Adv Mask Technology Ctr GmbH & Co KG

SPIE Involvement:

Author

Publications (7)

Proceedings Article | 23 March 2011 Paper

Correcting image placement errors using registration control (RegC) technology

Erez Graitzer, Gunter Antesberger, Guy Ben-Zvi, Avi Cohen, Vladimir Dmitriev, Stephanie Winkelmeier

Proceedings Volume 7973, 797312 (2011) https://doi.org/10.1117/12.879885

KEYWORDS: Photomasks, Image registration, Overlay metrology, Scanners, Metrology, Manufacturing, Semiconducting wafers, Silica, Algorithm development, Prototyping

Read Abstract +

Proceedings Article | 25 September 2010 Paper

Improving registration measurement capability by defining a 2D grid standard using multiple registration measurement tools

O. Loeffler, G. Antesberger, A. Ullrich, J. Richter, A. Wiswesser, Masaru Higuchi, Tatsuhiko Kamibayashi, F. Laske, D. Adam, M. Ferber, K.-D. Roeth

Proceedings Volume 7823, 78232K (2010) https://doi.org/10.1117/12.864459

KEYWORDS: Calibration, Metrology, Image registration, Photomasks, Standards development, Double patterning technology, Manufacturing, Lithography, Image processing, Reticles

Read Abstract +

Proceedings Article | 19 May 2008 Paper

Registration measurement capability of VISTEC LMS IPRO4 with focus on small features

Christian Enkrich, Gunter Antesberger, Oliver Loeffler, Klaus-Dieter Roeth, Frank Laske, Karl-Heinrich Schmidt, Dieter Adam

Proceedings Volume 7028, 70282Y (2008) https://doi.org/10.1117/12.793104

KEYWORDS: Image registration, Photomasks, Error analysis, Metrology, Cadmium, Critical dimension metrology, Reticles, Double patterning technology, Quartz, Manufacturing

Read Abstract +

Proceedings Article | 20 October 2006 Paper

Analysis of the Vistec LMS IPRO3 performance and accuracy enhancement techniques

Gunter Antesberger, Sven Knoth, Frank Laske, Jens Rudolf, Eric Cotte, Benjamin Alles, Carola Bläsing, Wolfgang Fricke, Klaus Rinn

Proceedings Volume 6349, 63491M (2006) https://doi.org/10.1117/12.686089

KEYWORDS: Error analysis, Reticles, Distortion, Calibration, Photomasks, Image registration, Statistical analysis, Ceramics, Statistical methods, Interferometers

Read Abstract +

Proceedings Article | 15 March 2006 Paper

193-nm immersion photomask image placement in exposure tools

Eric Cotte, Benjamin Alles, Timo Wandel, Gunter Antesberger, Silvio Teuber, Manuel Vorwerk, Andreas Frangen, Frank Katzwinkel

Proceedings Volume 6154, 61541F (2006) https://doi.org/10.1117/12.656373

KEYWORDS: Photomasks, Image registration, Etching, Semiconducting wafers, Data analysis, Optical lithography, Lithography, Thermal effects, Electron beam lithography, Numerical simulations

Read Abstract +

Proceedings Article | 6 December 2004 Paper

Phase standard based on profilometer metrology standard

Gregory Hughes, Cindy Goodman, Gunter Antesberger, Stefan Burges, Troy Morrison, Alex Buxbaum

Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.581222

KEYWORDS: Calibration, Photomasks, Metrology, Quartz, Phase shifts, Laser metrology, Profilometers, Phase measurement, Laser optics, Etching

Read Abstract +

Proceedings Article | 6 December 2004 Paper

Pellicle choice for 193-nm immersion lithography photomasks

Eric Cotte, Ruediger Haessler, Benno Utess, Gunter Antesberger, Frank Kromer, Silvio Teuber

Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.569280

KEYWORDS: Pellicles, Reticles, Photomasks, Image registration, Adhesives, Immersion lithography, Printing, Numerical simulations, Polymers, Performance modeling

Read Abstract +

Showing 5 of 7 publications

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Keywords/Phrases

Search In:

Publication Years