Guy Ayal
Mask Inspection System Eng Manager at Applied Materials
SPIE Involvement:
Author
Publications (3)

Proceedings Article | 20 April 2011 Paper
Guy Ayal, Elena Malkes, Efraim Aharoni, Shimon Levi, Amit Siany, Ofer Adan, Eitan Shauly, Yosi Shacham-Diamand
Proceedings Volume 7971, 79711Q (2011) https://doi.org/10.1117/12.879322
KEYWORDS: Line width roughness, Cadmium, Line edge roughness, Resistors, Transistors, Lithography, Semiconducting wafers, Critical dimension metrology, Process control, Silicon

Proceedings Article | 2 April 2010 Paper
Guy Ayal, Eitan Shauly, Shimon Levi, Amit Siany, Ofer Adan, Yosi Shacham-Diamand
Proceedings Volume 7638, 76380O (2010) https://doi.org/10.1117/12.846601
KEYWORDS: Transistors, Line width roughness, Line edge roughness, Computer aided design, Cadmium sulfide, Optical proximity correction, Semiconducting wafers, Front end of line, Metrology, OLE for process control

Proceedings Article | 13 March 2009 Paper
Guy Ayal, Eitan Shauly, Israel Rotshtein, Ovadya Menadeva, Amit Siany, Ram Peltinov, Yosi Shacham-Diamand
Proceedings Volume 7275, 72750Y (2009) https://doi.org/10.1117/12.813953
KEYWORDS: Line edge roughness, Transistors, Lithography, Line width roughness, Design for manufacturing, Optical lithography, Photoresist materials, Optical proximity correction, Process control, Photoresist developing

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