Latest advances of high intensity laser facilities enable the beam transport of petawatt laser pulses and can provide novel fundamental insights in high energy plasma physics or laser fusion. The very high peak intensities put enormous demands on the required large sized optics. Beam transport mirrors reflect pulses with only several tens of fs and maintain their phase while providing best possible laser induced damage threshold. State of the art, such mirrors are mostly manufactured by thermal evaporation techniques as they provide a large and uniform deposition area. Their porous layer structure causes changing spectral characteristics and wavefront when vacuum-air cycled. Especially large sized mirrors can show crazing and thereby decrease up-time of PW beamlines. In contrast, sputtered layers are very compact and provide non changing characteristics. Stable and reproducible sputter processes enable the deposition of more complex design structures necessary for further optimization of the laser induced damage threshold. However, deposition rate is slow and an uniform large sized area difficult to achieve for sputtered coatings. In our study, we show a self-constructed and built-up ion beam sputtering (IBS) machine capable to deposit large sized substrates up to a diameter of 550 mm. A design study is presented to evaluate best HR810nm mirror to meet demanding spectral requirements and providing maximized laser damage threshold for HAPLS at ELI beamlines. In the end, a field optimized design is applied with a measured LIDT of 0.9 J/cm2 at 42 fs and 1 kHz. This design is used to manufacture beam transport mirrors for HAPLS applying IBS.
Nowadays, continuous wave (cw) lasers have conquered a broad spectrum of applications in industrial laser processing and can be considered as the dominant tools in many manufacturing floors. This is reflected by the enormous average annual growth rates of 25-30 % and the continuous research efforts dedicated to this laser type leading to ever increasing output power and beam quality. This development imposes ever increasing demands on the quality of the optical laser components, that have to withstand the usually harsh industrial environment and high power levels. In fact, the corresponding of the laser components is a key factor for the efficiency and economic success of an employed laser material process. This in turn requires a thorough assessment of the quality parameters ruling the stability of such components. Among many other quality parameters, the Laser Induced Damage Threshold (LIDT) is one of the leading parameters that has to be investigated in detail. The corresponding measurement facilities and protocols as well as the evaluation of the data have to be performed with high reproducibility and comparability among different testing laboratories. As a consequence, such qualifications can only be achieved on the basis of well-defined international standards defining the complete procedure for the determination of LIDT values. We investigated the laser induced damage threshold of different types of optics using a cw laser with a wavelength of 1030 nm and power up to 6 kW, applying beam diameters of approximately 200-300 µm on the surface. The samples were irradiated for at least 30s or until damage occurred. First, it was necessary to review the existing DIN EN ISO 21254 regarding cw-irradiation of mirrors with a 25 mm diameter. An important aspect is the number of possible irradiation spots on each optic with respect to the damage size as well as the emitted debris. Both effects limit the statistical accuracy, the ISO procedure needs to be adapted to the measurement conditions. Additionally, we investigated the influence of substrate materials and coating processes on the LIDT of high reflective coatings and their damage behavior, especially regarding their thermal conductivity. The results were then compared with simulations concerning the maximum temperature within the optical component.
Dielectric cavity mirrors for storage-ring free-electron lasers (FELs) in the VUV range have to overcome several challenges including resistance to synchrotron radiation and long-term stability in a contaminated vacuum. While oxide materials are not suitable below 190 nm, pure fluoride materials are not stable in this challenging environment. It has not been possible until now to generate lasing below 176 nm in a storage ring FEL. Duke University/TUNL and Laser Zentrum Hannover have successfully developed new strategies and produced mirrors with a high reflectivity of 95 %, which enabled FEL lasing between 168,6 and 176,7 nm.
The present contribution is addressed to an improved method to fabricate dielectric dispersive compensating mirrors (CMs) with an increased laser induced damage threshold (LIDT) by the use of ternary composite layers. Taking advantage of a novel in-situ phase monitor system, it is possible to control the sensitive deposition process more precisely. The study is initiated by a design synthesis, to achieve optimum reflection and GDD values for a conventional high low stack (HL)n. Afterwards the field intensity is analyzed, and layers affected by highest electric field intensities are exchanged by ternary composites of TaxSiyOz. Both designs have similar target specifications whereby one design is using ternary composites and the other one is distinguished by a (HL)n. The first layers of the stack are switched applying in-situ optical broad band monitoring in conjunction with a forward re-optimization algorithm, which also manipulates the layers remaining for deposition at each switching event. To accomplish the demanded GDD-spectra, the last layers are controlled by a novel in-situ white light interferometer operating in the infrared spectral range. Finally the CMs are measured in a 10.000 on 1 procedure according to ISO 21254 applying pulses with a duration of 130 fs at a central wavelength of 775 nm to determine the laser induced damage threshold.
Simulation and modeling find more and more their way into thin film technology. Beside theoretical models for layer design, pre-production design analysis, and real time process control, atomistic simulation techniques gain of importance. Here, especially classical procedures such as Direct Simulation and Particle-in-Cell Monte Carlo (DSMC/PIC-MC), kinetic Monte Carlo (kMC) and Molecular Dynamics (MD) as well as quantum mechanical techniques based on Density Functional Theory (DFT) have to be mentioned. These methods are applied in order to investigate the material transport inside the coating facilities, the thin film growth in dependence of characteristic process conditions, and the optical and electronic thin film properties. By combination of these atomistic techniques in a suitable manner, a multiple scale simulation model can be realized for investigating the influence of specific process conditions on the resulting layer properties. The further extension of this “virtual coater” concept with respect to rate equation models enables the possibility to investigate also the interaction of laser irradiation with the modeled thin film structures.
In the presented work a fast frequency domain measurement system to determine group delay (GD) and group delay dispersion (GDD) of optical coatings is proposed. The measurements are performed in situ directly on moving substrates during the thin film coating process. The method is based on a Michelson interferometer, which is equipped with a high power broad band light source and a fast spectrometer. Especially for the production of chirped mirrors it is advantageous to obtain group delay and group delay dispersion data of the last layers. This additional information allows for online corrections of coating errors to enhance the precision of complex interference filters for short pulse applications.
Composite organic-inorganic coatings are realized by ion beam sputtering (IBS) from a zone target consisting of PTFE and Al2O3. The composition of the sputtered coatings is measured by Energy-Dispersive X-ray spectroscopy and the molecular structure is analyzed by Fourier Transform Infrared spectroscopy. The variation of the refractive index and the optical quality in dependence of the carbon-fluorine content for different material compositions is investigated. Furthermore, the intrinsic stress of the coatings is analyzed and a change from compressive to tensile stress in dependence of the composition is observed. The production of ion beam sputtered composite coatings with low refractive index and tensile stress is demonstrated.
The present contribution is concentrated on an improved method to manufacture dielectric dispersion compensating mirrors in the ultra violet (UV) range by applying a novel online phase monitoring device. This newly developed measurement tool monitors the group delay (GD) and group delay dispersion (GDD) of the electromagnetic field in situ during the deposition of the layer system. Broad band monitoring of the phase enhances the accuracy in the near infrared spectral range (NIR), significantly. In this study, the correlation of the GDD in the NIR and in the UV spectral range is investigated. A design synthesis is introduced to achieve optimum reflection and GDD target values in the UV and NIR. This requires a similar behavior of both bands according to deposition errors, to guarantee switching off the UV GDD target band proper, while monitoring the GDD in the NIR spectral range. The synthesis results in a design, characterized by a GDD of -100fs2±20fs2 between 330nm and 360nm in the UV and by -450fs2±10fs2 within 820nm to 870nm in the NIR. The fabricated sample, applying an ion beam sputtering process, consists of a 9μm layer stack of Hafnium oxide and Silicon dioxide. The first layers of the stack are switched and controlled by a conventional in situ spectrometric broad band monitoring in conjunction with a forward re-optimization algorithm, which also manipulates the layers remaining for deposition at each switching event. To accomplish the demanded GDD-spectra, the last layers are controlled by the novel in situ GDD monitor.
The generation of third harmonic radiation (THG) is required for many pulsed solid-state laser applications in industry
and science. In this contribution, the coatings for two necessary optical components, dichroic mirrors and nonlinear
optical (NLO) crystals are in the focus of investigation. Because of the high bulk damage threshold lithium triborate
(LBO) crystals are applied for this study. HfO2/SiO2 mixtures are employed as high refractive index material to improve
the power handling capability of the multilayers. All coatings are produced by ion beam sputtering (IBS) using a zone
target assembly for the deposition of material mixtures. The atomic composition and the oxidation ratio of different
HfO2/SiO2 mixtures are analyzed by X-ray photoelectron spectroscopy (XPS). The influence of different deposition
temperatures and post annealing on the optical properties and the amorphous micro structure of the films is investigated
by UV/Vis/NIR spectroscopy and X-ray diffraction (XRD). The laser induced damage thresholds at 355 nm wavelength
for nanosecond pulse durations are measured in a 10,000on1 experiment according with the standard ISO21254.
Furthermore, the optical components are tested under real application conditions.
We report on the laser damage resistance of thin films prepared by Ion Beam Sputtering. The samples are fused silica
substrates coated with single layer films of pure oxides (SiO2, Nb2O5, ZrO2, HfO2, Ta2O5, Al2O3, Sc2O3) and oxide mixtures with various ratios (Nb2O5/SiO2, ZrO2/SiO2, HfO2/SiO2, Ta2O5/SiO2, Al2O3/SiO2 and Sc2O3/SiO2). For this study the LIDT of more than 60 different samples have measured at 1030nm with pulse durations of 500fs with single pulse irradiation. The results are expressed and compared in terms of LIDT as a function of the measured band gap
energy and refractive index. For simple oxide materials a linear evolution of the LIDT with bandgap is observed, with the exception of Sc2O3 material where a very high damage threshold is observed, compared to other high index materials. In the case of mixtures, a more complex behavior is evidenced.
We report an experimental investigation in the laser-induced damage threshold (LIDT) of optical coatings materials. The
samples are single layers of Al2O3, Nb2O5, HfO2, SiO2, Ta2O5, ZrO2 deposited through different deposition techniques
(evaporation or sputtering with/without ion assistance) and mixtures of Al2O3/SiO2, Nb2O5/SiO2, HfO2/SiO2, Ta2O5/SiO2 and ZrO2/SiO2 on silica substrates. The LIDT is measured at 1030nm, 500fs in single shot mode. The results are
expressed and compared in term of LIDT as a function of bandgap and LIDT as a function of refractive index.
High reflecting multilayer coatings play a key role for many applications of pulsed Nd:YAG high power lasers in
industry and science. In the present contribution, improvements in the optical properties and the radiation resistance of
high reflectors for 355nm and 1064nm wavelength on the basis of mixture materials are discussed. Within a co-operation
between the LASEROPTIK GmbH and the Laser Zentrum Hannover e.V., several deposition processes including Ion
Beam Sputtering, Magnetron Sputtering, and Electron Beam Evaporation could be addressed for this study. The selected
material combinations HfO2+ZrO2/SiO2, HfO2+Al2O3/SiO2, HfO2+SiO2/SiO2 and HfO2/SiO2 were deposited using a
zone target assembly for the IBS technique or defined material mixtures for the evaporation process. Single layers of the
applied mixtures were analyzed by UV/Vis/NIR spectroscopy to correlate the optical constants with the atomic
compositions quantified by Energy Dispersive X-ray Spectroscopy (EDX) and X-ray Photoelectron Spectroscopy (XPS).
In addition to pure material reference mirrors and reflecting multilayer coatings with high index material mixtures, also
interference coatings consisting of nanolaminates as well as multilayer systems with refractive index profiles were
produced. The laser induced damage thresholds at 1064nm wavelength for nanosecond pulse durations were measured in
a 1000on1 experiment complying with the standard ISO11254. For the 355nm high reflectors, the radiation resistance
was determined in a 10000on1 procedure, furthermore, the radiation-induced absorption was measured by laser
calorimetry according to ISO11551. Finally, the layer interfaces and the amorphous microstructure of selected
multilayers were analyzed by Transmission Electron Microscopy (TEM) to obtain detailed information about possible
partial crystallinity. The results are interpreted in the context of former investigations on the power handling capability of
coating systems involving material mixtures.
Ever increasing demands in the field of optical coating systems with highest complexity impose new challenges on the
development of advanced deposition techniques with increased stability, and especially on the corresponding precise
thickness monitoring strategies. Most of the classical thickness monitoring concepts employed in industrial production,
which are based on quartz crystal or optical monitoring, are presently operated near to their precision limits. However,
resulting from extensive research activities, monitoring concepts could be significantly extended during the last years.
On the one hand, newly developed hybrid process control algorithms combine the information of the optical and non-optical
sensors to achieve a higher precision and fault-tolerance. On the other hand, independent thickness monitors are
integrated in flexible manufacturing concepts which include adapted computational manufacturing tools as well as
specific re-calculation and design re-optimization modules. Computational manufacturing allows for a design pre-selection
prior to deposition with essentially improved certainty which could not be achieved with classical error analysis
until now. In contrast, the re-calculation and re-optimization modules are on-line tools that monitor the running
deposition process. In case of critical deviations, a fully automated modification of the residual design assures a
successful achievement of specifications under the chosen monitoring technique.
Enhanced strategies in optical broadband monitoring allow for thin film deposition under rapid production conditions
with very high process stability. Recent developments in the field include simulation techniques with virtual deposition
systems, to enable a pre-selection of different multilayer designs, and hybrid process control strategies which combine
optical monitoring with quartz crystal monitoring. In particular, automated online error re-calculation and design re-optimization
are presently in the focus of research to improve the efficiency of deposition plants. In this contribution a
developed re-optimization module is presented, and the resulting increase in production yield of complicated multilayer
designs is demonstrated by deposition examples. Besides automated design changes directly initiated by the re-calculation
software, the presented approach also considers supervising functions that stop the deposition run when
critical errors are detected.
The present study deals with the characterization of hafnia, alumina, and zirconia coatings as well as mixtures
thereof with respect to applications in the UV. Emphasis is placed on optical properties, particularly on the
relation between UV refractive index and absorption edge. The shift of the coatings is investigated as well as the
mechanical stress. Finally, we present the results of stress measurements performed for quarterwave stacks
deposited on different substrates in a broad range of deposition temperatures. In this study, no systematic
dependence of the result of the stress measurement on the substrate material and geometry could be identified.
The aim of this work is the optimization of the resonator optics of excimer laser systems to achieve longer lifetimes and
to reduce the cost of ownership. The degradation after long-term exposure to high photon fluxes (typically 80 mJ/cm2 at
the ArF laser wavelength of 193 nm was analyzed. Based on the investigations, a model describing the process of the
deterioration of the out-coupling partial reflector was developed. It was found that contamination of the optics by the
laser's discharge electrodes leads to absorption losses on the surface facing the inside of the resonator. As a consequence,
the laser irradiation causes a temperature gradient in the CaF2-substrates which leads to crystal cleavage and braking of
the optics. Defects on the outward surface are the origin for the growth of Calcite crystals and organic compounds by
photo induced chemical reactions of the substrate material and contaminations in the purge gas. It was demonstrated that
the lifetime of the resonator optics can be substantially increased by adapted optical designs and coatings.
In many applications of ArF - excimer lasers, a specific degradation effect is observed for the CaF2 outcoupling
windows which starts assumedly at the rear surface and results in a characteristic damage morphology.
In the present study, this degradation mechanism is examined in a measurement series involving a variety of
window samples and irradiation sequences in an excimer laser with typical numbers of up to 2×108 pulses for
each component. The irradiated samples were inspected by scanning spectrophotometry, TOF-SIMS, electron
microscopy and other analytical techniques in order to clarify the underlying degradation mechanisms. On the
basis of the experimental findings, coating strategies will be outlined to improve the lifetime of CaF2 - output
couplers in 193nm excimer lasers.
Interference filters for spectroscopic purposes or sensor applications are characterized by strictly specified spectral
blocking and transmitting regions with intermediate steep edges. These steep edges must be positioned within nanometer
accuracy while the coating may consist of more than one hundred non-quarterwave layers. Though modern ion assisted
deposition processes in conjunction with quartz crystal control are well suited for the production of complex filters, an
optical monitoring device seems to be necessary to fulfill the demanding spectral requirements. Broad band optical
monitoring (BBM) directly on the calotte has been employed to control the production of this type of band stop filters.
For a large number of also different types of these coatings the BBM-technique demonstrated its capability to improve
the reliability and flexibility in industrial production. Within a stable well-characterized deposition process error self-compensation
effects allow for a fast realization of various designs within specified tolerances. Nevertheless, optical
broad band monitoring could not be applied to all types of these steep edge filters because error propagation leads to
unreachable solutions of the thickness tracing algorithm for specific cases. The given examples of complex steep filters
and the corresponding post analysis of stored online spectra as well as the simulation of the monitoring process reveal
the influence of the design itself to this occurrence. A suggestion for an identification of critical thickness values within
the layer sequence is discussed and solutions to the problems are presented.
The substrate temperature is one of the key parameters, which determines the optical properties of deposited dielectric
coatings. Depending on the employed material and application, the accurate knowledge of the substrate temperature is
crucial for the system performance. Currently, the heating process inside the evacuated deposition plant is usually
performed by radiation sources. The temperature of the substrates is governed be their emission and absorption
characteristics and in minor degree, by heat conduction to the substrate holders. Pyrometric methods and temperature
sensors are commonly used to measure the temperature close to the substrates. In any case, the measured temperature
can deviate extremely from the real substrate temperature. In particular, if materials with a high transmittance in the IR
range are used, the heating process can be controlled only with a large error by the conventional methods.
In this contribution, an adapted method using optical characterisation of the substrate is presented to determine precisely
the substrate temperature. In the described method, the optical transmittance of the components is measured and the
absorption characteristic in the VUV and visible spectral range is used to evaluate the current substrate temperature.
The production of advanced optical coatings with complex spectral characteristics and high performance is directly
dependent on the stability of the deposition process and on the accuracy of the monitoring system employed for
controlling the thickness of the constituent single layers. The present contribution is concentrated on the current state in
deposition control and manufacturing of coatings with improved precision. As major topics the simulation of deposition
processes, modern monitoring concepts, and the handling of errors occurring during the deposition process will be discussed. For illustration of some recent developments, results on the deposition of rugate filters on the basis of an ion beam sputtering process will be presented.
The term photocatalysis is used to describe a photon-driven catalytic process. Titanium dioxide is a well-known
photocatalyst in such fields as self-cleaning material and anti-microbial effects. Besides these photocatalytic applications,
TiO2 is a widely-used high index material for optical thin films.
In the present investigation, the photocatalytic activity of transparent TiO2 thin films was optimized to achieve
multifunctional high precision optical coatings. The films have been deposited by ion assisted deposition (IAD), applying
a Leybold APS plasma source as well as a Denton CC-105 ion source. The cause-and-effect chain between the use of
different parameters in the IAD process and optical properties of the TiO2 layers as well as their photocatalytic activities
are described.
As test reaction for the determination of the photocatalytic properties, the degradation of methylene blue (MB) was
chosen. The used setup based on a high precision two-path laser measurement system was developed by the LZH in
order to determine the kinetic performance of TiO2 catalysts under well-defined UV illumination conditions. Photonic
efficiencies of the TiO2 thin films were calculated from the obtained data. Additionally, crystal structure analysis has
been investigated for the identification of anatase and rutile modifications.
The comparison of the results shows that ion assisted deposition is an appropriate technology for the preparation of
photocatalytic active thin films for optical applications.
It is well known that optical dielectric coatings show a change in performance when altering the environmental
condition from air to vacuum. Evacuating or venting a set-up will shift the spectral characteristic and also the damage
behavior of the specimen. With respect to the spectral shift it has been observed that dense dielectric coatings
manufactured by Ion Assisted Deposition and Ion Beam Sputtering do not show this modification.
This work was performed to investigate AR coatings of different deposition processes to determine whether the LIDT of
dense layers can also be kept stable in vacuum. It was found that the damage threshold of these dense coatings is also
stable in an evacuated environment.
During the last decade the ever increasing demand for both high-quality optical coatings and virtually deterministic deposition processes has led to a large number of ion sources available for deposition purposes. For a successful implementation of an ion source the prime economic objectives process stability and production yield have to be considered. The economic efficiency is strongly dependent on the temporal stability and spatial distribution of the ion current density and ion energy spectrum. Retarding Field Analyzers have demonstrated their potential as a tool for the analysis of ion sources. However, deliberate evaluation of the measurements is required especially at a non-zero angle of incidence occurring during the examination of three dimensional ion emission profiles. The present study discusses the influence of different geometric Faraday-Cup designs on the resulting data as well as erroneous conclusions potentially drawn from measurements. Furthermore first results of the ion current density distribution characteristics of different ion sources, evaluated on the basis of data taken by a multicup array are presented.
Since first publications on optical broadband monitoring 25 years ago, the technological progress in computational speed and hardware made it possible to expand this basic approach to a versatile tool for thin film thickness control. During the last few years, essential progress could be achieved for optical monitoring systems operating in the visible and near infrared spectral range. In conjunction with powerful computer algorithms these systems allow a precise determination of the thickness of a growing layer during deposition and the reliable production of very complex nonquarterwave interference filters. It was shown earlier that the application of such a monitoring system in an IBS-(ion beam sputtering)-process enables a fully automated rapid prototyping of optical coatings with very complicated designs. Using the ion beam sputter process with its immanent reproducibility of the optical coating properties, even the precise control of layers with a thickness of around a few nanometers is possible. Offering the capability of producing designs containing such delicate thin layers, this process concept opens new prospects for a new class of thin film systems. Recently, the high potentiality of this monitoring concept in applications to ion-assisted coating processes (IAD) could be demonstrated. This paper is concentrated on an examination of error sources, which brought a further improvement in reliability of the monitoring system.
As a consequence of the ever increasing application field of modern optical technologies, new demands for the optimization of deposition processes for high quality optical coatings with increased environmental stability and power handling capability are imposed on thin film manufacturers. Starting from this challenge, the presented work is focused on the development of an ion assisted deposition (IAD) process using a cold cathode ion source. Especially in the mid
infrared wavelength region (MIR) with its water absorption bands, the ion assisted deposition process leads to many practical advantages, e.g. for medical laser applications.
In the present study, a cold cathode ion source was operated with pure oxygen for the deposition of different oxide materials. Besides the determination of the optical properties, the characterization of the thin films included the first application of an in situ optical broadband monitoring system during the IAD process.
The produced single layers and MIR coatings are thermally stable, shift-free, and exhibit lower absorption compared to conventionally deposited coatings. In contrast to the conventional coatings, also no vacuum-to-air shift is observed for the realized MIR coatings. Therefore, the stable and reproducible IAD process in combination with the new process control strategies using the broadband transmittance measurements on the moving substrates allows an advanced process control and a precise determination of the layer thickness.
The presented work is embedded in the research network “Integrative Ion Processes for Modern Optics”, called IntIon, consisting of 12 partners from the German optics industry and two research institutes. The main target of the IntIon network is the development of new process concepts on the basis of ion assisted deposition (IAD) for the industrial production of optical thin film components. Besides an improvement in efficiency, a major aim is concentrated on the optical characteristics for selected application fields with high economical potential. In this network, different ion and plasma sources are compared with regard to their qualification for ion assisted deposition processes. This work includes the characterization of the ion energy and ion current using Faraday-cup measurements. The selection of investigated coating materials includes a broad variety of standard and non-standard oxides. First results of the network will be presented for adapted deposition materials and different operation characteristics of ion sources.
SiO2, Ta2O5 and MgF2 have been deposited by electron beam evaporation under bombardment of ions generated by three different ion or plasma sources. Multilayer systems containing 5 to 12 layers have been designed and realized. The maximum reflectance R of a glass/air interface can be reduced down to R < 0.5 percent in a spectral region of 400 nm to 700 nm with each of such AR coatings mostly exceeds that of all-oxide system in the shorter wavelength region. With scanning scratch test the scratch resistance of the coatings have been determined relative to each other.
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