Dr. Hitoshi Kosugi Profile

Dr. Hitoshi Kosugi

EUV Project Leader at Tokyo Electron Kyushu Ltd

SPIE Involvement:

Author

Publications (17)

Proceedings Article | 18 April 2013 Paper

Paper

DSA hole defectivity analysis using advanced optical inspection tool

Ryota Harukawa, Masami Aoki, Andrew Cross, Venkat Nagaswami, Tadatoshi Tomita, Seiji Nagahara, Makoto Muramatsu, Shinichiro Kawakami, Hitoshi Kosugi, Benjamen Rathsack, Takahiro Kitano, Jason Sweis, Ali Mokhberi

Proceedings Volume 8681, 86811A (2013) https://doi.org/10.1117/12.2011177

KEYWORDS: Inspection, Semiconducting wafers, Wafer inspection, Reticles, Wafer-level optics, Epitaxy, Optical inspection, Defect inspection, Optical lithography, Directed self assembly

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Proceedings Article | 1 April 2013 Paper

Paper

Track processing optimizations for different EUV resist platforms: preparing for a NXE:3300 baseline process

Philippe Foubert, Koichi Matsunaga, Hideo Shite, Takeshi Shimoaoki, Kathleen Nafus, Anne-Marie Goethals, Dieter Van Den Heuvel, Jan Hermans, Eric Hendrickx, Hitoshi Kosugi

Proceedings Volume 8679, 86792T (2013) https://doi.org/10.1117/12.2011514

KEYWORDS: Photoresist processing, Semiconducting wafers, Extreme ultraviolet, Line width roughness, Standards development, Extreme ultraviolet lithography, Coating, Inspection, Image processing, Plasma

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Proceedings Article | 23 March 2012 Paper

Paper

Latest cluster performance for EUV lithography

H. Shite, K. Matsunaga, K. Nafus, H. Kosugi, P. Foubert, J. Hermans, E. Hendrickx, M. Goethals, D. Van Den Heuvel

Proceedings Volume 8322, 83222Y (2012) https://doi.org/10.1117/12.916388

KEYWORDS: Semiconducting wafers, Extreme ultraviolet, Extreme ultraviolet lithography, Critical dimension metrology, Line width roughness, Photoresist processing, Image processing, Scanners, Manufacturing, Particles

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Proceedings Article | 16 April 2011 Paper

Paper

Investigation of processing performance and requirements for next generation lithography cluster tools

M. Enomoto, T. Shimoaoki, K. Nafus, N. Nakashima, K. Tsutsumi, H. Marumoto, H. Kosugi, P. Derwin, R. Maas, C. Verspaget, J. Mallmann, R. Vangheluwe, I. Lamers, E. van der Heijden, S. Wang

Proceedings Volume 7972, 79722X (2011) https://doi.org/10.1117/12.879380

KEYWORDS: Particles, Semiconducting wafers, Critical dimension metrology, Thin film coatings, Silica, Scanners, Contamination, Lithography, Photoresist processing, Particle contamination

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Proceedings Article | 8 April 2011 Paper

Paper

EUV processing investigation on state of the art coater/developer system

H. Shite, N. Bradon, T. Shimoaoki, S. Kobayashi, K. Nafus, H. Kosugi, P. Foubert, J. Hermans, E. Hendrickx, M. Goethals, R. Gronheid, C. Jehoul

Proceedings Volume 7969, 796937 (2011) https://doi.org/10.1117/12.879406

KEYWORDS: Photoresist processing, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Semiconducting wafers, Etching, Standards development, Manufacturing, Particles, Critical dimension metrology

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Proceedings Article | 8 April 2011 Paper

Paper

Availability of underlayer application to EUV process

Hitoshi Kosugi, Carlos Fonseca, Fumiko Iwao, Hiroshi Marumoto, Hyun-Woo Kim, Kyoungyong Cho, Cheol-Hong Park, Chang-Min Park, Hai-Sub Na, Cha-Won Koh, Hanku Cho

Proceedings Volume 7969, 79692E (2011) https://doi.org/10.1117/12.878730

KEYWORDS: Coating, Semiconducting wafers, Contamination, Extreme ultraviolet, Data modeling, Calibration, Extreme ultraviolet lithography, Scanning electron microscopy, Etching, Thin films

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Proceedings Article | 31 March 2010 Paper

Paper

Evaluation of next generation hardware for lithography processing

T. Shimoaoki, M. Enomoto, K. Nafus, H. Marumoto, H. Kosugi, J. Mallmann, R. Maas, C. Verspaget, E. van der Heijden, S. Wang

Proceedings Volume 7639, 763922 (2010) https://doi.org/10.1117/12.846523

KEYWORDS: Semiconducting wafers, Photoresist processing, Thin film coatings, Lithography, Critical dimension metrology, Scanning electron microscopy, Manufacturing, Scatterometry, Photomicroscopy, Optical calibration

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Proceedings Article | 23 March 2010 Paper

Paper

Further investigation of EUV process sensitivities for wafer track processing

Neil Bradon, K. Nafus, H. Shite, J. Kitano, H. Kosugi, M. Goethals, S. Cheng, J. Hermans, E. Hendrickx, B. Baudemprez, D. Van Den Heuvel

Proceedings Volume 7636, 763630 (2010) https://doi.org/10.1117/12.846610

KEYWORDS: Semiconducting wafers, Extreme ultraviolet lithography, Extreme ultraviolet, Critical dimension metrology, Photomasks, Photoresist processing, Manufacturing, Wafer testing, Lithography, Reticles

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Proceedings Article | 23 March 2010 Paper

Paper

Challenges of EUVL resist process toward practical application

Shinichi Ito, Yukiko Kikuchi, Daisuke Kawamura, Eishi Shiobara, Keiichi Tanaka, Hitoshi Kosugi, Junichi Kitano, Takayuki Toshima

Proceedings Volume 7636, 76362V (2010) https://doi.org/10.1117/12.846260

KEYWORDS: Extreme ultraviolet lithography, Photoresist processing, Critical dimension metrology, Semiconducting wafers, Extreme ultraviolet, Surface plasmons, Photomasks, Lithography, Nanoimprint lithography, Line edge roughness

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Proceedings Article | 1 April 2009 Paper

Paper

Process-induced bias: a study of resist design, device node, illumination conditions, and process implications

Michael Carcasi, Steven Scheer, Carlos Fonseca, Tsuyoshi Shibata, Hitoshi Kosugi, Yoshihiro Kondo, Takashi Saito

Proceedings Volume 7273, 72730N (2009) https://doi.org/10.1117/12.814395

KEYWORDS: Diffusion, Photoresist processing, Fiber optic illuminators, Semiconducting wafers, Nanoimprint lithography, Optical proximity correction, Critical dimension metrology, Error analysis, Resist chemistry, Etching

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Proceedings Article | 1 April 2009 Paper

Paper

Improvements in process performance for immersion technology high volume manufacturing

K. Nafus, T. Shimoaoki, M. Enomoto, H. Shite, T. Otsuka, H. Kosugi, T. Shibata, J. Mallmann, R. Maas, C. Verspaget, E. van der Heijden, E. van Setten, J. Finders, S. Wang, N. Boudou, C. Zoldesi

Proceedings Volume 7273, 727338 (2009) https://doi.org/10.1117/12.813485

KEYWORDS: Semiconducting wafers, Particles, Scanners, Critical dimension metrology, Photomicroscopy, Photoresist processing, Contamination, Etching, Polymers, Bridges

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Proceedings Article | 1 April 2009 Paper

Paper

CD uniformity improvement for double-patterning lithography (litho-litho-etch) using freezing process

Hisanori Sugimachi, Hitoshi Kosugi, Tsuyoshi Shibata, Junichi Kitano, Koichi Fujiwara, Kouji Itou, Michihiro Mita, Akimasa Soyano, Shiro Kusumoto, Motoyuki Shima, Yoshikazu Yamaguchi

Proceedings Volume 7273, 72731D (2009) https://doi.org/10.1117/12.814033

KEYWORDS: Photoresist processing, Critical dimension metrology, Line width roughness, Lithography, Coating, Double patterning technology, Semiconducting wafers, Factor analysis, Etching, Neodymium

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Proceedings Article | 18 March 2009 Paper

Paper

Investigation of EUV-process sensitivities for wafer-track processing

Neil Bradon, Heiko Weichert, K. Nafus, S. Hatakeyama, J. Kitano, H. Kosugi, K. Yoshihara, M. Goethals, J. Hermans

Proceedings Volume 7271, 727148 (2009) https://doi.org/10.1117/12.814189

KEYWORDS: Semiconducting wafers, Extreme ultraviolet, Extreme ultraviolet lithography, Photoresist processing, Critical dimension metrology, Finite element methods, Double patterning technology, Image processing, Standards development, Lithography

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Proceedings Article | 4 December 2008 Paper

Paper

Defect transfer from immersion exposure process to etching process using novel immersion exposure and track system

Osamu Miyahara, Hitoshi Kosugi, Shannon Dunn, Youri van Dommelen, Cedric Grouwstra

Proceedings Volume 7140, 71403A (2008) https://doi.org/10.1117/12.804677

KEYWORDS: Etching, Bridges, Lithography, Immersion lithography, Particles, Defect inspection, Double patterning technology, Scanning electron microscopy, Coating, Semiconductors

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Proceedings Article | 4 April 2008 Paper

Paper

Process manufacturability evaluation for next generation immersion technology node

M. Enomoto, T. Shimoaoki, T. Otsuka, S. Hatakeyama, K. Nafus, R. Naito, Y. Terashita, T. Shibata, H. Kosugi, M. Jyousaka, J. Mallmann, R. Maas, M. Blanco Mantecon, E. van Setten, J. Finders, S. Wang, C. Zoldesi

Proceedings Volume 6923, 69231W (2008) https://doi.org/10.1117/12.772552

KEYWORDS: Semiconducting wafers, Critical dimension metrology, Manufacturing, Inspection, Standards development, Scanners, Bridges, Particles, Metrology, High volume manufacturing

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Proceedings Article | 1 April 2008 Paper

Paper

Random 65nm..45nm C/H printing using optimized illumination source and CD sizing by post processing

Jo Finders, Eddy Van der Heijden, Gert-Jan Janssen, Rik Vangheluwe, Tsuysohi Shibata, Ryouichirou Naitou, Hitoshi Kosugi, Hisanori Sugimachi

Proceedings Volume 6924, 69242Y (2008) https://doi.org/10.1117/12.773595

KEYWORDS: Reticles, Optical proximity correction, Printing, Lithographic illumination, Photoresist processing, Critical dimension metrology, Semiconducting wafers, Lithography, Scanning electron microscopy, Double patterning technology

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Proceedings Article | 23 March 2007 Paper

Paper

Initial process evaluation for next generation immersion technology node

Tadatoshi Tomita, Kathleen Nafus, Shinichi Hatakeyama, Hitoshi Kosugi, Masashi Enomoto, Shin Inoue, Kirsten Ruck, Heiko Weichert, Mireia Blanco Mantecon, Raf Stegen, Casper de Groot, Richard Moerman

Proceedings Volume 6519, 65192B (2007) https://doi.org/10.1117/12.712206

KEYWORDS: Semiconducting wafers, Bridges, Molecular bridges, Diffractive optical elements, Manufacturing, Metrology, Image processing, Particles, Optical lithography, Scanners

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Showing 5 of 17 publications

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