CONFERENCE PROCEEDINGS
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Hitoshi Maeda
at HOYA Corp
SPIE Involvement:
Author
Publications (4)
Proceedings Article | 13 November 2024 Presentation
EUV mask blanks with low-n absorber
Hitoshi Maeda, Yohei Ikebe, Masanori Nakagawa, Takuro Ono, Takahiro Onoue
Proceedings Volume 13216, 132161A (2024) https://doi.org/10.1117/12.3034673
KEYWORDS: Extreme ultraviolet, Lithography, Reflectivity, Nanoimprint lithography, Scanners, Materials properties, Industry, High volume manufacturing, Extreme ultraviolet lithography, Dose control
Proceedings Article | 10 April 2024 Paper
Proposal of cap layer design combined with absorber for EUV mask
Y. Ikebe, H. Maeda, T. Umezawa, T. Onoue
Proceedings Volume 12953, 129530H (2024) https://doi.org/10.1117/12.3011257
KEYWORDS: Lithography, Nanoimprint lithography, Film thickness, Binary data, Extreme ultraviolet, Phase shifts, Reflectivity, Multilayers, Extreme ultraviolet lithography, Optical properties
Proceedings Article | 12 October 2021 Presentation + Paper
Precision phase angle control with transmissive etching stop film
Hiroaki Shishido, Osamu Nozawa, Ryo Ohkubo, Hitoshi Maeda, Masahiro Hashimoto
Proceedings Volume 11855, 118550O (2021) https://doi.org/10.1117/12.2600852
KEYWORDS: Etching, Silica, Transmission electron microscopy
Proceedings Article | 29 August 2019 Paper
Continuous challenges for next era of lithography
Takahiro Hiromatsu, Ryo Ohkubo, Hitoshi Maeda, Toru Fukui, Hiroaki Shishido, Kazunori Ono, Masahiro Hashimoto
Proceedings Volume 11177, 1117705 (2019) https://doi.org/10.1117/12.2534910
KEYWORDS: Extreme ultraviolet, Nanoimprint lithography, Binary data, Semiconducting wafers
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