Dr. Hsuen-Li Chen Profile

Dr. Hsuen-Li Chen

at National Taiwan Univ

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Author

Publications (15)

Proceedings Article | 5 May 2008 Paper

Using self-assembled nanoparticles to fabricate and optimize sub-wavelength textured structures in solar cells

D. Wan, H. Chen, C. Yu, Y. Lee

Proceedings Volume 7002, 70020X (2008) https://doi.org/10.1117/12.781279

KEYWORDS: Silicon, Nanoparticles, Gold, Etching, Semiconducting wafers, Reflectivity, Solar cells, Antireflective coatings, Refractive index, Wet etching

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Proceedings Article | 16 April 2008 Paper

Using optical thin film model to optimize thermal annealing procedure in P3HT:PCBM blend based solar cells

W. H. Lee, H. L. Chen, S. Y. Chuang, T. H. Chen, W. F. Su

Proceedings Volume 6999, 69991L (2008) https://doi.org/10.1117/12.781318

KEYWORDS: Annealing, Absorption, Solar cells, Refractive index, Organic photovoltaics, Crystals, Thin films, Photovoltaics, Interfaces, Reflectivity

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Proceedings Article | 5 December 2006 Paper

Using N-type organic material with photoconductivity for low-reflectance OLEDs

Kai-Hsiang Chuang, Yu-Hsuan Ho, Jiun-Haw Lee, Chun-Chieh Chao, Man-Kit Leung, Cheng-Yu Li, Hsuen-Li Chen

Proceedings Volume 6333, 63331Q (2006) https://doi.org/10.1117/12.682698

KEYWORDS: Organic light emitting diodes, Metals, Control systems, Aluminum, Organic materials, Reflectivity, Reflection, Silver, Destructive interference, Absorption

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Proceedings Article | 24 July 2002 Paper

Multi-layer bottom antireflective coating structures for high NA ArF exposure system applications

Hsuen-Li Chen, W. Fan, Tzyy-Jiann Wang, Tiao-Yuan Huang

Proceedings Volume 4690, (2002) https://doi.org/10.1117/12.474184

KEYWORDS: Reflectivity, Silicon, Interfaces, Bottom antireflective coatings, Lithography, Antireflective coatings, Silicon films, Resolution enhancement technologies, Copper, Aluminum

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Proceedings Article | 16 July 2002 Paper

Metal characterization and process enhancement techniques for photolithographic materials

Fu-Hsiang Ko, Hsuen-Li Chen, Chun-Chen Hsu, Tieh-Chi Chu

Proceedings Volume 4689, (2002) https://doi.org/10.1117/12.473512

KEYWORDS: Photoresist materials, Reflectivity, Metals, Microwave radiation, Statistical analysis, Reflection, Plasma, Mass spectrometry, Computer simulations, Bottom antireflective coatings

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SPIE Journal Paper | 1 April 2002

Novel bi-layer bottom antireflective coating structure for high-performance ArF lithography applications

Hsuen-Li Chen, W. Chao, Fu-Hsiang Ko, Tien-Chi Chu, Tiao-Yuan Huang

JM3, Vol. 1, Issue 01, (April 2002) https://doi.org/10.1117/12.10.1117/1.1447947

KEYWORDS: Reflectivity, Silicon, Deep ultraviolet, Aluminum, Lithography, Tolerancing, Bottom antireflective coatings, Absorption, Etching, Copper

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Proceedings Article | 19 October 2001 Paper

Multimode interference couplers using polymeric optical waveguides

Chih-Wei Hsu, Hsuen-Li Chen, Way-Seen Wang

Proceedings Volume 4579, (2001) https://doi.org/10.1117/12.444870

KEYWORDS: Waveguides, Brain-machine interfaces, Polymers, Polymer multimode waveguides, Reactive ion etching, Tolerancing, Electro optic polymers, Transmittance, Anisotropic etching, Etching

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Proceedings Article | 16 October 2001 Paper

Cladding layer for photonic integrated circuits

Chih-Wei Hsu, Way-Seen Wang, Hsuen-Li Chen, Tzyy-Jiann Wang, Yan Huang

Proceedings Volume 4603, (2001) https://doi.org/10.1117/12.444564

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Proceedings Article | 14 September 2001 Paper

Low-dielectric-constant FLARE 2.0 films as bottom antireflective coating layers for ArF lithography

Hsuen-Li Chen, Hsu-Chun Cheng, Mei-Yi Li, Fu-Hsiang Ko, Tiao-Yuan Huang, Tien-Chi Chu

Proceedings Volume 4346, (2001) https://doi.org/10.1117/12.435637

KEYWORDS: Reflectivity, Etching, Lithography, Dielectrics, Photomasks, Optical lithography, Oxides, Bottom antireflective coatings, Silicon, Tantalum

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Proceedings Article | 5 September 2001 Paper

Fabry-Perot-type antireflective coating for deep-ultraviolet binary photomask application

Hsuen-Li Chen, Chien-Kui Hsu, Ben-Chang Chen, Fu-Hsiang Ko, Tiao-Yuan Huang, Tien-Chi Chu

Proceedings Volume 4409, (2001) https://doi.org/10.1117/12.438347

KEYWORDS: Fabry–Perot interferometers, Reflectivity, Antireflective coatings, Photomasks, Oxides, Binary data, Deep ultraviolet, Reflection, Absorption, Metals

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Proceedings Article | 22 August 2001 Paper

Process development and impurities analysis for the bottom antireflective coating material

Fu-Hsiang Ko, Hsuen-Li Chen, Tiao-Yuan Huang, Hsu-Chun Cheng, Chu-Jung Ko, Tieh-Chi Chu

Proceedings Volume 4344, (2001) https://doi.org/10.1117/12.436779

KEYWORDS: Photoresist materials, Reflection, Microwave radiation, Refractive index, Statistical analysis, Semiconducting wafers, Bottom antireflective coatings, Interfaces, Silicon, Coating

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Proceedings Article | 20 August 2001 Paper

Chemically amplified deep UV resists for electron-beam lithography applications

Hsuen-Li Chen, Chien-Kui Hsu, Ben-Chang Chen, Fu-Hsiang Ko, Jung-Yen Yang, Tiao-Yuan Huang, Tien-Chi Chu

Proceedings Volume 4343, (2001) https://doi.org/10.1117/12.436705

KEYWORDS: Deep ultraviolet, Electron beam lithography, Etching, Lithography, Oxides, Chemically amplified resists, Process control, Electron beams, Optical lithography, Polymethylmethacrylate

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Proceedings Article | 26 July 1999 Paper

Silicon-oxynitride films prepared for 157-nm attenuated phase-shifting masks

Hsuen-Li Chen, Lon Wang, L. Yeh, F. Lai

Proceedings Volume 3679, (1999) https://doi.org/10.1117/12.354314

KEYWORDS: Silicon, Silicon films, Etching, Calcium, Photoresist materials, Phase shifts, Phase shifting, Sputter deposition, Refractive index, Semiconductor lasers

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Proceedings Article | 25 June 1999 Paper

Simulation on a new reflection type attenuated phase-shifting mask for extreme ultraviolet lithography

Hsuen-Li Chen, Lon Wang

Proceedings Volume 3676, (1999) https://doi.org/10.1117/12.351131

KEYWORDS: Germanium, Reflectivity, Phase shifts, Absorption, Multilayers, Reflection, Photomasks, Extreme ultraviolet lithography, Reflectors, Phase shifting

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Proceedings Article | 19 June 1998 Paper

Characteristics of fiber Bragg grating with deuterium loading

Chih-Wei Hsu, Lon Wang, Hsuen-Li Chen

Proceedings Volume 3420, (1998) https://doi.org/10.1117/12.312850

KEYWORDS: Fiber Bragg gratings, Optical fibers, Annealing, Reliability, Diffusion, Ultraviolet radiation, Refractive index, Absorption, Reflectivity, Holography

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Showing 5 of 15 publications

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