Dr. Hyeon-Jun Ha Profile

Dr. Hyeon-Jun Ha

at SAMSUNG Electronics Co Ltd

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Author

Publications (4)

Proceedings Article | 10 April 2024 Presentation + Paper

Computational distortion prediction method considering characteristics of EUV lithography

Jong-hyun Hwang, Jae-il Lee, Hyeon-jun Ha, Jung-hwan Kim, Kwang-sun Song, Young-jin Park

Proceedings Volume 12953, 129530L (2024) https://doi.org/10.1117/12.3010639

KEYWORDS: Extreme ultraviolet, Distortion, Simulations, Overlay metrology, Semiconducting wafers, Deep ultraviolet, Optical lithography, Extreme ultraviolet lithography, Zernike polynomials, Projection systems

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Proceedings Article | 27 April 2023 Poster + Paper

Absolute alignment measurement of underlayer and overlayer of diffraction-based overlay mark by image-based alignment metrology system

Jaeil Lee, Iksun Park, Youngjin Park, Jonghyun Hwang, Hyeonjun Ha, Jaewoong Sohn, Jaehee Lee, Jinseok Moon, Yuki Kondo, Satoshi Ando

Proceedings Volume 12496, 124962F (2023) https://doi.org/10.1117/12.2657656

KEYWORDS: Overlay metrology, Optical alignment, Metrology

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Proceedings Article | 23 March 2020 Paper

Application of intra-field alignment to reduce wafer-to-wafer variation

Jangsun Kim, Seonho Lee, Hyunjun Ha, Boris Habets, Enrico Bellmann, Holger Bald, Tobias Hoeer, Seop Kim

Proceedings Volume 11327, 113270V (2020) https://doi.org/10.1117/12.2552735

KEYWORDS: Optical alignment, Semiconducting wafers, Overlay metrology, Neodymium, Computer simulations, Data modeling, Yield improvement, Electronics, Information technology, Standards development

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Proceedings Article | 26 March 2019 Paper

YieldStar uDBO overlay metrology in Samsung D1y DRAM volume production

Jang-Sun Kim, Jin-Moo Byun, Remco Lancee, Jong-Hyun Hwang, Hyeon-Jun Ha, Kwang-Young Hu, Se-Ra Jeon, Won-Jae Jang, Hyung-Sub Son, Vidar van der Meijden, Marc Noot, Bartosz Foltynski, Lukasz Macht, Grzegorz Grzela, Cedric Grouwstra

Proceedings Volume 10959, 109592M (2019) https://doi.org/10.1117/12.2514931

KEYWORDS: Overlay metrology, Metrology, Front end of line, Yield improvement, Control systems, Scatterometry

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